脉冲电压应力对无结铁电薄膜晶体管电退化影响的综合分析

IF 3.2 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
William Cheng-Yu Ma;Chun-Jung Su;Kuo-Hsing Kao;Ta-Chun Cho;Yu-Chieh Yen;Ji-Min Yang;Yi-Han Li;Yen-Chen Chen;Jhe-Yu Lin;Hui-Wen Chang
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引用次数: 0

摘要

本文研究了无结铁电薄膜晶体管(jl - ffts)在不同脉冲电压应力条件下的电退化行为,包括脉冲宽度(${t} _{\text {PW}}$)、脉冲幅度和脉冲极性。结果表明,延长的${t} _{\text {PW}}$和较高的脉冲幅度会显著降低器件的性能,表现为亚阈值摆幅(SS)增加,跨导(${G} _{\mathrm {m\_max}}$)降低,导通电流下降。此外,脉冲极性起着关键作用,双极脉冲应力比单极脉冲应力诱导更严重的退化。其中,双极应力下的SS降解和${G} _{\ maththrm {m\_max}}$降低分别达到0.331 V/decade和$0.209\times $,而正单极应力下的SS降解和$0.779\times $分别达到0.055 V/decade和$0.779\times $。结果表明,极化开关引起的附加损伤是由于铁电极化反转过程中电场应力的增强。在负单极脉冲应力下,由于空穴捕获导致的${V} _{\text {TH}}$的明显减少掩盖了SS的退化,而正单极脉冲应力主要增加${V} _{\text {TH}}$,并且电荷捕获效应最小。这些发现为jl - fet在存储器操作中的可靠性提供了有价值的见解,指导了存储器写入和擦除过程中最佳脉冲条件的选择。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Comprehensive Analysis of Pulse Voltage Stress Effects on Electrical Degradation in Junctionless Ferroelectric Thin-Film Transistors
This work investigates the electrical degradation behavior of junctionless ferroelectric thin-film transistors (JL-FeTFTs) under various pulse voltage stress conditions, including pulsewidth ( ${t} _{\text {PW}}$ ), pulse amplitude, and pulse polarity. The findings reveal that prolonged ${t} _{\text {PW}}$ and higher pulse amplitude significantly degrade device performance, evidenced by increased subthreshold swing (SS), reduced transconductance ( ${G} _{\mathrm {m\_max}}$ ), and a decline in on-state current. Furthermore, the pulse polarity plays a critical role, with bipolar pulse stress inducing more severe degradation than unipolar stress. Specifically, SS degradation and ${G} _{\mathrm {m\_max}}$ reduction under bipolar stress reach 0.331 V/decade and $0.209\times $ , respectively, compared to 0.055 V/decade and $0.779\times $ for positive unipolar stress. The results suggest that the additional damage caused by polarity switching is attributed to the intensified electric field stress during ferroelectric polarization reversal. Under negative unipolar pulse stress, a pronounced ${V} _{\text {TH}}$ reduction due to hole trapping overshadows SS degradation, whereas positive unipolar stress primarily increases ${V} _{\text {TH}}$ with minimal charge trapping effects. These findings provide valuable insights into the reliability of JL-FeTFTs in memory operations, guiding the selection of optimal pulse conditions for memory write and erase processes.
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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