三元范德华AB2X4单晶薄膜的广义外延配方

IF 9.7 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Yujie Ouyang , Chunxia Li , Haoran Ge , Weixiao Lin , Tingting Su , Qiwei Tong , Jiangfan Luo , Fan Yan , Zhuo Chen , Dawen Jiang , Xisheng Yang , Yong Liu , Yan Zhao , Siqi Huo , Min Hong , Qingjie Zhang , Wei Liu , Xinfeng Tang
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引用次数: 0

摘要

二维范德华(vdW)三元AB2X4薄膜在量子输运、热电学、相变存储器和自旋电子学等领域显示出巨大的潜力。然而,由于难以精确控制三种元素组分和复杂的生长动力学条件,制备高质量的相纯vdW三元AB2X4 (000l)薄膜具有挑战性。在此,我们开发了一种通用的外延配方,用于工程AB2X4 (000l)薄膜的生长动力学,以精确控制化学计量并避免二元杂质。以MnSb2Te4 (000l)为例,利用分子束外延技术成功地制备了尺寸为10 × 10 mm2的高质量、相纯AB2X4 (000l)薄膜,并取得了良好的再现性。通过合理调整生长参数,可以有效地控制MnSb2Te4薄膜的化学计量。此外,通过衬底表面工程、适当的缓冲层和层层退火工艺,成功地实现了MnSb2Te4薄膜的稳定生长。所建立的外延成功地应用于另外5种AB2X4 (000l)薄膜的大面积制备,为复杂vdW三元薄膜的可控制备和应用奠定了重要基础。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

A generalized epitaxy recipe for ternary van der Waals AB2X4 single crystalline thin films

A generalized epitaxy recipe for ternary van der Waals AB2X4 single crystalline thin films

A generalized epitaxy recipe for ternary van der Waals AB2X4 single crystalline thin films
Two-dimensional van der Waals (vdW) ternary AB2X4 thin films have shown great potential in fields such as quantum transport, thermoelectrics, phase-change memory and spintronics. However, it is challenging to fabricate high-quality, phase-pure vdW ternary AB2X4 (000l) thin films, due to the difficulty of precise control over three elemental components and the complex growth kinetic conditions. Herein, we developed a general epitaxy recipe for engineering the growth kinetics of AB2X4 (000l) thin films to precisely control the stoichiometry and avoid binary impurities. Taking MnSb2Te4 (000l) as the typical example, we successfully demonstrated the fabrication of high-quality, phase-pure AB2X4 (000l) thin films with size of 10 × 10 mm2 by molecular beam epitaxy technique, achieving excellent reproducibility. The stoichiometry of MnSb2Te4 thin films could be effectively controlled by rationally tuning growth parameters. Moreover, the stable growth of MnSb2Te4 thin films was successfully achieved through substrate surface engineering, appropriate buffer layers, and layer-by-layer annealing processes. The established epitaxy was successfully applied to the large-area fabrication of five other AB2X4 (000l) thin films, which lays an important foundation for the controllable fabrication and application of complex vdW ternary thin films.
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来源期刊
Materials Today Physics
Materials Today Physics Materials Science-General Materials Science
CiteScore
14.00
自引率
7.80%
发文量
284
审稿时长
15 days
期刊介绍: Materials Today Physics is a multi-disciplinary journal focused on the physics of materials, encompassing both the physical properties and materials synthesis. Operating at the interface of physics and materials science, this journal covers one of the largest and most dynamic fields within physical science. The forefront research in materials physics is driving advancements in new materials, uncovering new physics, and fostering novel applications at an unprecedented pace.
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