利用ClAlPc/C70吸光层增强响应性的五苯基近红外有机光电晶体管

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Ching-Lin Fan , Hou-Yen Tsao , Bo-Ren Lin
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引用次数: 0

摘要

在本文中,我们提出了一种具有ClAlPc/C70异质结吸收层的高响应有机五苯基光电晶体管(OPT),用于780 nm波长的近红外(NIR)光传感。ClAlPc在近红外区表现出较强的光吸收。富勒烯(C70)通常作为受体材料与ClAlPc作为给体材料结合形成异质结结构,以增强激子解离,实现高性能光电器件。并五苯/ClAlPc/C70之间的能级排列产生内部电场,使激子解离效率提高,有效的电荷输运到有源层,从而产生高光电流。该器件具有3.36 AW-1的高响应率,在780 nm波长处EQE高达534%。本研究通过设计具有最佳厚度的ClAlPc/C70吸收层,提出了一种具有优异近红外光响应性和激子解离性的高性能OPT。研究认为,具有ClAlPc/C70异质结吸光层的五苯基OPT将是开发高性能nir光电器件的良好候选材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pentacene-based near-infrared organic phototransistor with enhanced responsivity by using ClAlPc/C70 light-absorbing-layer
In this paper, we proposed a high responsive organic pentacene-based phototransistor (OPT) with ClAlPc/C70 heterojunction absorbing-layer designed for near-infrared (NIR) light sensing at the wavelength of 780 nm. ClAlPc exhibits strong optical absorption in the near-infrared region. Fullerene (C70) is commonly used as acceptor materials combinate with the ClAlPc as donor materials to form heterojunction structure to enhance the exciton dissociation and achieve high performance OPTs. The energy level alignment between pentacene/ClAlPc/C70 generates an internal electric field to cause the increased efficiency of the exciton dissociation and the efficient charge transport to the active layer, leading to high photocurrent. The proposed device has high responsivity of 3.36 AW-1 and achieves a high EQE of 534 % at the wavelength of 780 nm. This work proposes a high-performance OPT with excellent near-infrared light responsivity and exciton dissociation as a result of the designed ClAlPc/C70 absorbing layer with the optimal thickness. It believes that the pentacene-based OPT with the ClAlPc/C70 heterojunction light-absorbing layer will be a good candidate for the development of high-performance NIR-optoelectronic devices.
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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