A. Sanchez-Soares , T. Kelly , S.-K. Su , E. Chen , G. Fagas , J.C. Greer
{"title":"二硫化钼场效应晶体管的量子模拟,包括接触效应","authors":"A. Sanchez-Soares , T. Kelly , S.-K. Su , E. Chen , G. Fagas , J.C. Greer","doi":"10.1016/j.sse.2025.109162","DOIUrl":null,"url":null,"abstract":"<div><div>Two-dimensional (2D) materials have attracted considerable interest for use as channel material in field-effect transistors (FETs) due to their potential for high packing densities and efficient electrostatic control. However, achieving low contact resistances remains a significant challenge for integrated circuit manufacture. This study presents a methodology that enables device simulations explicitly including the effects of contact stacks within a quantum mechanical framework. A means for optimizing device structures including contact effects is demonstrated and validated against experimental and <em>ab initio</em> data for metal–semimetal–semiconductor contacts for optimizing source/drain resistance in monolayer molybdenum disulfide (ML-MoS<sub>2</sub>) FETs.</div></div>","PeriodicalId":21909,"journal":{"name":"Solid-state Electronics","volume":"229 ","pages":"Article 109162"},"PeriodicalIF":1.4000,"publicationDate":"2025-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Quantum simulations of MoS2 field effect transistors including contact effects\",\"authors\":\"A. Sanchez-Soares , T. Kelly , S.-K. Su , E. Chen , G. Fagas , J.C. Greer\",\"doi\":\"10.1016/j.sse.2025.109162\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Two-dimensional (2D) materials have attracted considerable interest for use as channel material in field-effect transistors (FETs) due to their potential for high packing densities and efficient electrostatic control. However, achieving low contact resistances remains a significant challenge for integrated circuit manufacture. This study presents a methodology that enables device simulations explicitly including the effects of contact stacks within a quantum mechanical framework. A means for optimizing device structures including contact effects is demonstrated and validated against experimental and <em>ab initio</em> data for metal–semimetal–semiconductor contacts for optimizing source/drain resistance in monolayer molybdenum disulfide (ML-MoS<sub>2</sub>) FETs.</div></div>\",\"PeriodicalId\":21909,\"journal\":{\"name\":\"Solid-state Electronics\",\"volume\":\"229 \",\"pages\":\"Article 109162\"},\"PeriodicalIF\":1.4000,\"publicationDate\":\"2025-06-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Solid-state Electronics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0038110125001078\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid-state Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0038110125001078","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Quantum simulations of MoS2 field effect transistors including contact effects
Two-dimensional (2D) materials have attracted considerable interest for use as channel material in field-effect transistors (FETs) due to their potential for high packing densities and efficient electrostatic control. However, achieving low contact resistances remains a significant challenge for integrated circuit manufacture. This study presents a methodology that enables device simulations explicitly including the effects of contact stacks within a quantum mechanical framework. A means for optimizing device structures including contact effects is demonstrated and validated against experimental and ab initio data for metal–semimetal–semiconductor contacts for optimizing source/drain resistance in monolayer molybdenum disulfide (ML-MoS2) FETs.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.