室温激光烧蚀氧化铬薄膜的可调态密度

Angel Regalado-Contreras;Wencel de la Cruz
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引用次数: 0

摘要

在室温下,通过反应性激光烧蚀在不同的O2压力下沉积氧化铬薄膜,并使用原位x射线光电子能谱分析。cr2p光谱表现出自旋轨道分裂,峰值分离在9.2 ~ 9.5 eV之间。鉴定出Cr3+、Cr4+态,2p3/2结合能在576.8 ~ 582.5 eV之间。定量分析证实,较低的O2压力有利于Cr2O3的生长,而较高的O2压力有利于cr2的生长。近费米能级谱显示出明显的态密度调制,价带最大值从1.25 eV移至3.3 eV。建立了氧压力与电子结构之间的直接关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Tunable Density-of-States in Chromium Oxide Thin Films via Room Temperature Laser Ablation
Chromium oxide thin films were deposited at room temperature, via reactive laser ablation under varying O2 pressures and analyzed using in-situ X-ray Photoelectron Spectroscopy. Cr 2p spectra exhibited spin-orbit splitting, with peak separations ranging from 9.2 to 9.5 eV. Cr3+, and Cr4+ states were identified, with 2p3/2 binding energies between 576.8 and 582.5 eV. Quantitative analysis confirmed that lower O2 pressures favored Cr2O3 growth, while higher pressures promoted CrO2. Near-Fermi-level spectra revealed significant Density-Of-States modulation, with the Valence Band Maximum shifting from 1.25 to 3.3 eV. A direct correlation between O2 pressure and electronic structure was established.
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