纳米线隧道场效应管的分析建模与仿真研究

IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Parveen Kumar;Balwinder Raj;Girish Wadhwa
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引用次数: 0

摘要

本文建立了一种具有栅极全能结构和带到带隧穿机制的纳米线隧道场效应晶体管(NWTFET)的解析模型。该模型适用于源、漏、通道等所有区域,能准确测量电势、传输特性,且不受短通道效应的影响。在不同的偏置条件下(VDS和VGS),用金属功函数、掺杂浓度、氧化物厚度和沟道材料的变化对漏极电流和表面电位进行了评价。通过TCAD仿真对观测结果进行了验证。通过将硅衬底划分为3个不同区域(I、II、III),确定其他区域的二维泊松方程(PE),设计了表面电位模型。为了在各种边界条件下恰当地利用泊松方程,采用了描述性抛物近似策略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analytical Modeling and Simulation Investigation of Nanowire Tunnel FET for Potential and Drain Current Evaluation
An analytical model of nanowire-tunnel field effect transistor (NWTFET) has been developed in this article with a gate-all-around structure and band-to-band tunneling (BTBT) mechanism. The proposed model is effective for operation in all regions such as source, drain, channel and measures accurate potential, transfer characteristics and is immune to short channel effect. The drain current and surface potential have been evaluated with the variation in metal work function, doping concentration, oxide thickness and channel material at different bias conditions (VDS and VGS). The validation of observed results has been performed through TCAD simulations. The surface potential model is designed by separating the substrate of silicon into three dissimilar areas (I, II, III) and determining the 2-D Poisson’s equation (PE) in other areas. To utilize Poisson’s Equation appropriately at various boundary conditions, a descriptive parabolic approximation strategy is used.
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来源期刊
IEEE Transactions on Nanotechnology
IEEE Transactions on Nanotechnology 工程技术-材料科学:综合
CiteScore
4.80
自引率
8.30%
发文量
74
审稿时长
8.3 months
期刊介绍: The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.
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