{"title":"具有极性控制的均匀单层WSe 2通道低功耗CMOS逆变器","authors":"Ching-Hao Hsu;Fa-Rong Hou;Ta-Wei Hsu;Yu-Tung Lin;Sui-An Chou;Ming-Han Chang;Li-Ya Chiu;Zheng-Da Huang;I-Chih Ni;Ang-Sheng Chou;Chih-I Wu","doi":"10.1109/LED.2025.3564164","DOIUrl":null,"url":null,"abstract":"While performance metrics of innovative technology-nodes continue to improve rapidly, energy efficiency has not kept pace. In this work, we successfully constructed a homogeneous CMOS inverter using monolayer tungsten diselenide (WSe2, a promising candidate can maintain good mobility at atomic-level thickness and offers better resistance to short-channel effects. Through different contact engineering and passivation doping approaches, the polarity of WSe2 could be effectively tailored. These module improvements are helpful to investigate the impact on threshold voltage of several critical process steps and match performance of both n and p-type field-effect transistors with low effective oxide thickness back-gate dielectrics in enhancement-mode operation. In addition, the inverters demonstrate superior performance at a relevant supply voltage (VDD) of 1.5 V: voltage gain exceeding 10 V/V, noise margin over 80%, picowatt-range static-power consumption, and near-ideal switching voltage of half-VDD. Reaching these numbers simultaneously opens up the possibilities for future-generation applications of two-dimensional material-based electronic components.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"46 7","pages":"1231-1234"},"PeriodicalIF":4.1000,"publicationDate":"2025-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Low-Power CMOS Inverter Using Homogeneous Monolayer WSe₂ Channel With Polarity Control\",\"authors\":\"Ching-Hao Hsu;Fa-Rong Hou;Ta-Wei Hsu;Yu-Tung Lin;Sui-An Chou;Ming-Han Chang;Li-Ya Chiu;Zheng-Da Huang;I-Chih Ni;Ang-Sheng Chou;Chih-I Wu\",\"doi\":\"10.1109/LED.2025.3564164\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"While performance metrics of innovative technology-nodes continue to improve rapidly, energy efficiency has not kept pace. In this work, we successfully constructed a homogeneous CMOS inverter using monolayer tungsten diselenide (WSe2, a promising candidate can maintain good mobility at atomic-level thickness and offers better resistance to short-channel effects. Through different contact engineering and passivation doping approaches, the polarity of WSe2 could be effectively tailored. These module improvements are helpful to investigate the impact on threshold voltage of several critical process steps and match performance of both n and p-type field-effect transistors with low effective oxide thickness back-gate dielectrics in enhancement-mode operation. In addition, the inverters demonstrate superior performance at a relevant supply voltage (VDD) of 1.5 V: voltage gain exceeding 10 V/V, noise margin over 80%, picowatt-range static-power consumption, and near-ideal switching voltage of half-VDD. Reaching these numbers simultaneously opens up the possibilities for future-generation applications of two-dimensional material-based electronic components.\",\"PeriodicalId\":13198,\"journal\":{\"name\":\"IEEE Electron Device Letters\",\"volume\":\"46 7\",\"pages\":\"1231-1234\"},\"PeriodicalIF\":4.1000,\"publicationDate\":\"2025-04-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Electron Device Letters\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10975789/\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10975789/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Low-Power CMOS Inverter Using Homogeneous Monolayer WSe₂ Channel With Polarity Control
While performance metrics of innovative technology-nodes continue to improve rapidly, energy efficiency has not kept pace. In this work, we successfully constructed a homogeneous CMOS inverter using monolayer tungsten diselenide (WSe2, a promising candidate can maintain good mobility at atomic-level thickness and offers better resistance to short-channel effects. Through different contact engineering and passivation doping approaches, the polarity of WSe2 could be effectively tailored. These module improvements are helpful to investigate the impact on threshold voltage of several critical process steps and match performance of both n and p-type field-effect transistors with low effective oxide thickness back-gate dielectrics in enhancement-mode operation. In addition, the inverters demonstrate superior performance at a relevant supply voltage (VDD) of 1.5 V: voltage gain exceeding 10 V/V, noise margin over 80%, picowatt-range static-power consumption, and near-ideal switching voltage of half-VDD. Reaching these numbers simultaneously opens up the possibilities for future-generation applications of two-dimensional material-based electronic components.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.