探索退火对CdS薄膜结构和光学性能的影响:结合实验和第一性原理研究

IF 3.1 3区 物理与天体物理 Q2 Engineering
Optik Pub Date : 2025-06-06 DOI:10.1016/j.ijleo.2025.172450
Bo Yue , Qigui Yang , Xuemei Li , Rui Cui , Yongbo Zhang , Shanshan Li , Rengang Zhang , Peng Zhang , Runsheng Yu , Xingzhong Cao
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引用次数: 0

摘要

缺陷是决定半导体材料性能的关键因素,其影响可以通过加工技术有效调节。本研究采用一种新的溅射-蒸发-溅射(SES)方法,在金属靶上进行退火制备CdS薄膜。结合各种实验技术和第一性原理计算,深入研究了退火温度对CdS薄膜结构和光学性能的影响。结果表明:未退火的Cd薄膜前驱体结晶度差,透光率低,存在未反应的Cd;退火可显著提高CdS薄膜的结晶度。透过率和化学计量比随退火温度的升高而升高,但温度越高则越低。最佳的退火条件使前驱体完全转变为CdS薄膜,而过高的温度导致硫逸出和硫空位的形成。经第一性原理计算和正电子湮灭多普勒增宽光谱证实,硫空位显著导致了高温下透射率的下降。本研究可望为CdS薄膜的热处理和空位管理提供新的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Probing the effect of annealing on the structural and optical properties of CdS thin films: Combining experimental and first-principles study
Defects play a pivotal role in determining the performance of semiconductor materials, and their influence can be effectively adjusted through processing techniques. In this study, CdS thin films were prepared using a novel sputtering-evaporation-sputtering (SES) method with metal target followed with annealing. The effects of annealing temperature on the structural and optical properties of CdS film were thoroughly investigated by combining various experimental techniques with first-principles calculations. The results showed that the unannealed precursor of CdS film has poor crystallinity and low transmittance, with unreacted Cd present. Annealing significantly improves crystallinity of CdS films. The transmittance and stoichiometric ratio initially increase with annealing temperature but decrease at higher temperatures. Optimal annealing conditions enable a complete transformation of precursors into CdS films, while excessive temperatures lead to the escape of sulfur and the formation of sulfur vacancies. Sulfur vacancies, confirmed by first-principles calculations and positron annihilation Doppler broadening spectroscopy, significantly contribute to the observed transmittance degradation at elevated temperatures. This research is expected to provide insights into the thermal treatment and vacancy management of CdS thin films.
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来源期刊
Optik
Optik 物理-光学
CiteScore
6.90
自引率
12.90%
发文量
1471
审稿时长
46 days
期刊介绍: Optik publishes articles on all subjects related to light and electron optics and offers a survey on the state of research and technical development within the following fields: Optics: -Optics design, geometrical and beam optics, wave optics- Optical and micro-optical components, diffractive optics, devices and systems- Photoelectric and optoelectronic devices- Optical properties of materials, nonlinear optics, wave propagation and transmission in homogeneous and inhomogeneous materials- Information optics, image formation and processing, holographic techniques, microscopes and spectrometer techniques, and image analysis- Optical testing and measuring techniques- Optical communication and computing- Physiological optics- As well as other related topics.
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