Arka Halder, Martin Vanbrabant, Dimitri Lederer, Jean-Pierre Raskin, Valeriya Kilchytska
{"title":"器件布局对mosfet自热萃取的影响","authors":"Arka Halder, Martin Vanbrabant, Dimitri Lederer, Jean-Pierre Raskin, Valeriya Kilchytska","doi":"10.1016/j.sse.2025.109175","DOIUrl":null,"url":null,"abstract":"<div><div>This work analyses the impact of device layout on self-heating (SH) extraction and treats it in terms of parasitic series resistance and heat evacuation paths. Specifically, the impact of having four-terminal (4T) gate access structures used in gate resistance technique for SH characterization is investigated. To evaluate the SH parameters, the RF characterization technique is utilized, which includes measuring S-parameters over a wide frequency range. Two devices are compared in this study based on the same core MOSFET: one with the 4T gate access structure and one without these additional accesses. It is experimentally demonstrated that a lower thermal resistance is observed for the 4T device. Apart from cooling through the 4T gate accesses which could explain this observation, it is seen that parasitic series resistances could also affect the extraction of thermal resistance through the RF technique. Through PDK simulations, the impact of the series resistances on SH extraction using the RF technique is explored further. The fact that even for the same core device the layout can affect the extracted thermal parameters is evidenced.</div></div>","PeriodicalId":21909,"journal":{"name":"Solid-state Electronics","volume":"229 ","pages":"Article 109175"},"PeriodicalIF":1.4000,"publicationDate":"2025-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Impact of Device Layout on Self-Heating Extraction in MOSFETs\",\"authors\":\"Arka Halder, Martin Vanbrabant, Dimitri Lederer, Jean-Pierre Raskin, Valeriya Kilchytska\",\"doi\":\"10.1016/j.sse.2025.109175\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This work analyses the impact of device layout on self-heating (SH) extraction and treats it in terms of parasitic series resistance and heat evacuation paths. Specifically, the impact of having four-terminal (4T) gate access structures used in gate resistance technique for SH characterization is investigated. To evaluate the SH parameters, the RF characterization technique is utilized, which includes measuring S-parameters over a wide frequency range. Two devices are compared in this study based on the same core MOSFET: one with the 4T gate access structure and one without these additional accesses. It is experimentally demonstrated that a lower thermal resistance is observed for the 4T device. Apart from cooling through the 4T gate accesses which could explain this observation, it is seen that parasitic series resistances could also affect the extraction of thermal resistance through the RF technique. Through PDK simulations, the impact of the series resistances on SH extraction using the RF technique is explored further. The fact that even for the same core device the layout can affect the extracted thermal parameters is evidenced.</div></div>\",\"PeriodicalId\":21909,\"journal\":{\"name\":\"Solid-state Electronics\",\"volume\":\"229 \",\"pages\":\"Article 109175\"},\"PeriodicalIF\":1.4000,\"publicationDate\":\"2025-06-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Solid-state Electronics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0038110125001200\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid-state Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0038110125001200","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Impact of Device Layout on Self-Heating Extraction in MOSFETs
This work analyses the impact of device layout on self-heating (SH) extraction and treats it in terms of parasitic series resistance and heat evacuation paths. Specifically, the impact of having four-terminal (4T) gate access structures used in gate resistance technique for SH characterization is investigated. To evaluate the SH parameters, the RF characterization technique is utilized, which includes measuring S-parameters over a wide frequency range. Two devices are compared in this study based on the same core MOSFET: one with the 4T gate access structure and one without these additional accesses. It is experimentally demonstrated that a lower thermal resistance is observed for the 4T device. Apart from cooling through the 4T gate accesses which could explain this observation, it is seen that parasitic series resistances could also affect the extraction of thermal resistance through the RF technique. Through PDK simulations, the impact of the series resistances on SH extraction using the RF technique is explored further. The fact that even for the same core device the layout can affect the extracted thermal parameters is evidenced.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.