Sarah Grützmacher, Wenkai Liu, Max Heyl, Patrick Asalem, Norbert Koch, Emil J. W. List-Kratochvil, Giovanni Ligorio
{"title":"突破障碍:超低电压下双极场效应晶体管中金介导剥离的厘米级单层WSe2","authors":"Sarah Grützmacher, Wenkai Liu, Max Heyl, Patrick Asalem, Norbert Koch, Emil J. W. List-Kratochvil, Giovanni Ligorio","doi":"10.1002/aelm.202500188","DOIUrl":null,"url":null,"abstract":"Transition Metal Dichalcogenides (TMDCs) are promising semiconductor alternatives to silicon in CMOS technology. Their layered nature allows scaling to a single layer (1L) without degrading electrical performance, enabling further miniaturization of field-effect transistors (FETs). TMDCs like WSe<sub>2</sub> exhibit ambipolar transport, allowing fabrication of both <i>p</i>-type and <i>n</i>-type devices on a single flake, simplifying circuit design. Ambipolar, large-area, high-quality 1L-WSe<sub>2</sub> is therefore highly desirable. Here, centimeter-scale exfoliated 1L-WSe<sub>2</sub> is achieved, reaching 1L areas of up to 20 mm<sup>2</sup> via thermally activated gold-mediated TMDC exfoliation using large, high-quality WSe₂ parent crystals. The quality of 1L-WSe2 is comprehensively investigated via Raman spectroscopy, photoluminescence, X-ray, and ultraviolet photoelectron spectroscopy, as well as electronic transport measurements. For the latter, 1L-WSe<sub>2</sub>-based FETs are fabricated on lithium-ion conducting glass ceramic substrates serving as both supporting substrate and high-performance gate. Subthreshold slopes as steep as 30 and 50 mV dec<sup>−1</sup>, maximum mobilities of 15 and 18 cm<sup>2</sup> V⁻¹ s⁻¹, and ON/OFF ratios of ≈10<sup>8</sup> and 10<sup>9</sup> for electron and hole currents, respectively, are achieved at ultra-low gate voltages (≈2 V). The performance, demonstrated across 15 devices, suggests that 1L-WSe<sub>2</sub> in this device architecture can pave the way toward providing an alternative to conventional silicon-based CMOS technology for innovative, further miniaturized devices.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"8 1","pages":""},"PeriodicalIF":5.3000,"publicationDate":"2025-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Breaking Barriers: Centimeter-Sized Single Layer WSe2 by Gold-Mediated Exfoliation for Ambipolar Field Effect Transistors at Ultra-Low Voltages\",\"authors\":\"Sarah Grützmacher, Wenkai Liu, Max Heyl, Patrick Asalem, Norbert Koch, Emil J. W. List-Kratochvil, Giovanni Ligorio\",\"doi\":\"10.1002/aelm.202500188\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Transition Metal Dichalcogenides (TMDCs) are promising semiconductor alternatives to silicon in CMOS technology. Their layered nature allows scaling to a single layer (1L) without degrading electrical performance, enabling further miniaturization of field-effect transistors (FETs). TMDCs like WSe<sub>2</sub> exhibit ambipolar transport, allowing fabrication of both <i>p</i>-type and <i>n</i>-type devices on a single flake, simplifying circuit design. Ambipolar, large-area, high-quality 1L-WSe<sub>2</sub> is therefore highly desirable. Here, centimeter-scale exfoliated 1L-WSe<sub>2</sub> is achieved, reaching 1L areas of up to 20 mm<sup>2</sup> via thermally activated gold-mediated TMDC exfoliation using large, high-quality WSe₂ parent crystals. The quality of 1L-WSe2 is comprehensively investigated via Raman spectroscopy, photoluminescence, X-ray, and ultraviolet photoelectron spectroscopy, as well as electronic transport measurements. For the latter, 1L-WSe<sub>2</sub>-based FETs are fabricated on lithium-ion conducting glass ceramic substrates serving as both supporting substrate and high-performance gate. Subthreshold slopes as steep as 30 and 50 mV dec<sup>−1</sup>, maximum mobilities of 15 and 18 cm<sup>2</sup> V⁻¹ s⁻¹, and ON/OFF ratios of ≈10<sup>8</sup> and 10<sup>9</sup> for electron and hole currents, respectively, are achieved at ultra-low gate voltages (≈2 V). The performance, demonstrated across 15 devices, suggests that 1L-WSe<sub>2</sub> in this device architecture can pave the way toward providing an alternative to conventional silicon-based CMOS technology for innovative, further miniaturized devices.\",\"PeriodicalId\":110,\"journal\":{\"name\":\"Advanced Electronic Materials\",\"volume\":\"8 1\",\"pages\":\"\"},\"PeriodicalIF\":5.3000,\"publicationDate\":\"2025-06-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced Electronic Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1002/aelm.202500188\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/aelm.202500188","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Breaking Barriers: Centimeter-Sized Single Layer WSe2 by Gold-Mediated Exfoliation for Ambipolar Field Effect Transistors at Ultra-Low Voltages
Transition Metal Dichalcogenides (TMDCs) are promising semiconductor alternatives to silicon in CMOS technology. Their layered nature allows scaling to a single layer (1L) without degrading electrical performance, enabling further miniaturization of field-effect transistors (FETs). TMDCs like WSe2 exhibit ambipolar transport, allowing fabrication of both p-type and n-type devices on a single flake, simplifying circuit design. Ambipolar, large-area, high-quality 1L-WSe2 is therefore highly desirable. Here, centimeter-scale exfoliated 1L-WSe2 is achieved, reaching 1L areas of up to 20 mm2 via thermally activated gold-mediated TMDC exfoliation using large, high-quality WSe₂ parent crystals. The quality of 1L-WSe2 is comprehensively investigated via Raman spectroscopy, photoluminescence, X-ray, and ultraviolet photoelectron spectroscopy, as well as electronic transport measurements. For the latter, 1L-WSe2-based FETs are fabricated on lithium-ion conducting glass ceramic substrates serving as both supporting substrate and high-performance gate. Subthreshold slopes as steep as 30 and 50 mV dec−1, maximum mobilities of 15 and 18 cm2 V⁻¹ s⁻¹, and ON/OFF ratios of ≈108 and 109 for electron and hole currents, respectively, are achieved at ultra-low gate voltages (≈2 V). The performance, demonstrated across 15 devices, suggests that 1L-WSe2 in this device architecture can pave the way toward providing an alternative to conventional silicon-based CMOS technology for innovative, further miniaturized devices.
期刊介绍:
Advanced Electronic Materials is an interdisciplinary forum for peer-reviewed, high-quality, high-impact research in the fields of materials science, physics, and engineering of electronic and magnetic materials. It includes research on physics and physical properties of electronic and magnetic materials, spintronics, electronics, device physics and engineering, micro- and nano-electromechanical systems, and organic electronics, in addition to fundamental research.