微透镜阵列的制备及其在亚微米结构中的应用

IF 5 2区物理与天体物理 Q1 OPTICS

Optics and Laser Technology Pub Date : 2025-06-09 DOI:10.1016/j.optlastec.2025.113324

Li-En Kang, Yu-Sheng Hsieh, Yeeu-Chang Lee

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引用次数: 0

摘要

本研究采用X-Y-Z三轴自底向上立体光刻3D微打印（μ-printing）系统制备微透镜阵列（Microlens Array， MLA）的印迹模。研究了曝光时间和物镜与打印平台之间的距离对MLA制作的影响。制作了结构高度分别为3.39 μm、5.19 μm和6.76 μm的三种MLA模具，曲率半径分别为16.44 μm、12.23 μm和10.78 μm。随后，使用PDMS将打印的MLA模具复制到印迹模具中，然后在印迹过程中使用PDMS复制MLA结构。将mla放置在三轴自上而下系统的z轴上，暴露在405nm波长的激光下。三种MLA的焦斑大小分别为1.96 μm、0.80 μm和0.57 μm。随后，利用高度为5.19 μm的MLA在SU-8负光刻电阻涂覆的硅衬底上制备亚微米结构。分析了MLA不同z轴运动速率对亚微米结构的影响。

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Fabrication of microlens array and its application of submicron structure

This study used an X-Y-Z three-axis bottom-up stereolithography 3D microprinting (μ-printing) system to fabricate imprinting molds for a Microlens Array (MLA). It investigates the effects of exposure time and the distance between the objective lens and printing platform on the fabrication of the MLA. Three types of MLA molds with structural heights of 3.39 μm, 5.19 μm, and 6.76 μm were fabricated, with curvature radii of 16.44 μm, 12.23 μm, and 10.78 μm, respectively. Subsequently, the printed MLA molds were replicated into imprinting molds using PDMS, which were then used in the imprinting processes to replicate the MLA structures. The MLAs were placed on the Z-axis of a three-axis top-down system and exposed to a 405 nm wavelength laser. The three types of MLA produced focal spots of 1.96 μm, 0.80 μm, and 0.57 μm, respectively. Afterwards, an MLA with a height of 5.19 μm was used to fabricate submicron structures on SU-8 negative photoresist-coated silicon substrates. The effects of different Z-axis moving rates for the MLA on the submicron structures were analyzed.

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来源期刊

Optics and Laser Technology 物理-光学

CiteScore

8.50

自引率

10.00%

发文量

1060

审稿时长

3.4 months

期刊介绍： Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems