{"title":"金属/薄介电型p-触点圆形p-GaN/p-AlGaN棒提高258nm algan基深紫外发光二极管的壁塞效率","authors":"Wenjie Li;Zhaoqiang Liu;Chunshuang Chu;Kangkai Tian;Fuping Huang;Yonghui Zhang;Xiao Wei Sun;Zi-Hui Zhang","doi":"10.1109/TED.2025.3558159","DOIUrl":null,"url":null,"abstract":"Very strong optical absorption and the poor hole injection efficiency make AlGaN-based deep-ultraviolet light-emitting diodes (DUV LEDs) encounter low external quantum efficiency (EQE) and poor light output power (LOP). To solve these issues, we design and fabricate circular p-GaN/p-AlGaN rods with a metal/thin dielectric-type p-contact for DUV LEDs. We find that the local removal of the p-GaN layer can significantly increase the light extraction efficiency (LEE). However, direct p-type contact on the exposed p-AlGaN layer causes the increased energy band barrier height. Hence, we utilize metal/thin low-k insulator/semiconductor (MIS)-based p-type contact on the p-AlGaN layer to reduce the energy band barrier height. The results show that the MIS structure effectively facilitates intraband tunneling effect and increase the hole injection efficiency. Therefore, the forward voltage is decreased and the wall-plug efficiency (WPE) gets improved. The proposed MIS-based p-type contact also favors the reduce leakage current before the devices are turned on, which is reflected by the reduced ideality factor. By investigating the rod sizes and the gap between the neighboring rods, we also find that the enhanced WPE shall take the tradeoff between the LEE and the hole injection efficiency into account.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 6","pages":"3017-3022"},"PeriodicalIF":2.9000,"publicationDate":"2025-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Circular p-GaN/p-AlGaN Rods With Metal/Thin Dielectric-Type p-Contact to Increase the Wall-Plug Efficiency for 258-nm AlGaN-Based Deep Ultraviolet Light Emitting Diodes\",\"authors\":\"Wenjie Li;Zhaoqiang Liu;Chunshuang Chu;Kangkai Tian;Fuping Huang;Yonghui Zhang;Xiao Wei Sun;Zi-Hui Zhang\",\"doi\":\"10.1109/TED.2025.3558159\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Very strong optical absorption and the poor hole injection efficiency make AlGaN-based deep-ultraviolet light-emitting diodes (DUV LEDs) encounter low external quantum efficiency (EQE) and poor light output power (LOP). To solve these issues, we design and fabricate circular p-GaN/p-AlGaN rods with a metal/thin dielectric-type p-contact for DUV LEDs. We find that the local removal of the p-GaN layer can significantly increase the light extraction efficiency (LEE). However, direct p-type contact on the exposed p-AlGaN layer causes the increased energy band barrier height. Hence, we utilize metal/thin low-k insulator/semiconductor (MIS)-based p-type contact on the p-AlGaN layer to reduce the energy band barrier height. The results show that the MIS structure effectively facilitates intraband tunneling effect and increase the hole injection efficiency. Therefore, the forward voltage is decreased and the wall-plug efficiency (WPE) gets improved. The proposed MIS-based p-type contact also favors the reduce leakage current before the devices are turned on, which is reflected by the reduced ideality factor. By investigating the rod sizes and the gap between the neighboring rods, we also find that the enhanced WPE shall take the tradeoff between the LEE and the hole injection efficiency into account.\",\"PeriodicalId\":13092,\"journal\":{\"name\":\"IEEE Transactions on Electron Devices\",\"volume\":\"72 6\",\"pages\":\"3017-3022\"},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2025-04-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Electron Devices\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10965721/\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10965721/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Circular p-GaN/p-AlGaN Rods With Metal/Thin Dielectric-Type p-Contact to Increase the Wall-Plug Efficiency for 258-nm AlGaN-Based Deep Ultraviolet Light Emitting Diodes
Very strong optical absorption and the poor hole injection efficiency make AlGaN-based deep-ultraviolet light-emitting diodes (DUV LEDs) encounter low external quantum efficiency (EQE) and poor light output power (LOP). To solve these issues, we design and fabricate circular p-GaN/p-AlGaN rods with a metal/thin dielectric-type p-contact for DUV LEDs. We find that the local removal of the p-GaN layer can significantly increase the light extraction efficiency (LEE). However, direct p-type contact on the exposed p-AlGaN layer causes the increased energy band barrier height. Hence, we utilize metal/thin low-k insulator/semiconductor (MIS)-based p-type contact on the p-AlGaN layer to reduce the energy band barrier height. The results show that the MIS structure effectively facilitates intraband tunneling effect and increase the hole injection efficiency. Therefore, the forward voltage is decreased and the wall-plug efficiency (WPE) gets improved. The proposed MIS-based p-type contact also favors the reduce leakage current before the devices are turned on, which is reflected by the reduced ideality factor. By investigating the rod sizes and the gap between the neighboring rods, we also find that the enhanced WPE shall take the tradeoff between the LEE and the hole injection efficiency into account.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.