高温退火后外延锐钛矿TiO2/LaAlO3薄膜的微观结构演变与相变

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2025-05-15 DOI:10.1016/j.tsf.2025.140700

Xiang Li , Yixiao Jiang , Tingting Yao , Ang Tao , Xuexi Yan , Min Tian , Zhiqing Yang , Hengqiang Ye , Chunlin Chen

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引用次数: 0

摘要

由于不同的TiO2多晶型表现出不同的光催化性能，二氧化钛的相变已经引起了人们几十年来的持续关注。在本研究中，采用脉冲激光沉积（PLD）技术在LaAlO3衬底上外延生长了单晶锐钛矿型TiO2 （A-TiO2）薄膜。利用先进的透射电子显微镜系统地研究了高温退火条件下制备的A-TiO2薄膜的微观结构演变和相变。结果表明，在1000℃退火后，A-TiO2薄膜没有发生相变，但畴界密度明显降低。1100℃退火后，薄膜由锐钛矿向金红石相变，薄膜由混合相组成。1200℃退火后，衬底中的La元素扩散到TiO2薄膜中，通过化学反应在LaAlO3衬底上形成了图案化的lao3纳米岛。这些结果为TiO2薄膜的高温应用提供了科学依据。

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Microstructure evolution and phase transitions of epitaxial anatase TiO2/LaAlO3 thin films after high-temperature annealing

Phase transitions of TiO₂ have attracted continuing interests for decades since different polymorphs of TiO₂ exhibit different photocatalytic performance. In this study, single-crystalline anatase TiO₂ (A-TiO₂) thin films were epitaxially grown on LaAlO₃ substrates by pulsed laser deposition (PLD). The microstructure evolution and phase transitions of the as-prepared A-TiO₂ thin films under high-temperature annealing were systematically investigated by advanced transmission electron microscopy. It was revealed that no phase transitions occurred in the A-TiO₂ thin films but the density of domain boundaries decreased significantly after annealing at 1000 °C. The phase transition from anatase to rutile occurred after annealing at 1100 °C and the films were composed of mixed phases. After 1200 °C annealing, La element in the substrate diffused into the TiO₂ films and patterned LaTiO₃ nano-islands were formed on the LaAlO₃ substrate due to chemical reaction. These results provide scientific basis for the high-temperature applications of TiO₂ thin film.

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.