{"title":"基于VTH补偿技术的多比特IGZO 2T0C DRAM","authors":"Kaifei Chen;Wendong Lu;Jiebin Niu;Menggan Liu;Fuxi Liao;Xuanming Zhang;Zihan Li;Naide Mao;Kaiping Zhang;Congyan Lu;Bok-Moon Kang;Jiawei Wang;Di Geng;Nianduan Lu;Guilei Wang;Zhengyong Zhu;Guanhua Yang;Chao Zhao;Arokia Nathan;Ling Li;Ming Liu","doi":"10.1109/JEDS.2025.3565658","DOIUrl":null,"url":null,"abstract":"In this work, we proposed and experimentally demonstrated the novel dual-gate (DG) indium-gallium-zinc oxide (IGZO) two-transistor-zero-capacitance (2T0C) dynamic random-access memory (DRAM) for array-level multi-bit storage. Unlike traditional 2T0C DRAM, data writing strategy of the novel DG bit-cell is discharging process from storage node (SN) to bit line, achieving in-cell threshold voltage (VTH) compensation without sacrificing bit-cell layout. VTH modulation derived from the top gate of read transistor makes noticeable <inline-formula> <tex-math>$\\Delta $ </tex-math></inline-formula>VSN boosting, with a record-high ratio (<inline-formula> <tex-math>$\\Delta $ </tex-math></inline-formula>VSN/<inline-formula> <tex-math>$\\Delta $ </tex-math></inline-formula>VDATA) of 1.46, which improves the headroom for multi-bit storage. Moreover, the optimized transistors with positive VTH and high ON-state current enable long retention time (>1500 s) and ultra-fast writing speed (< 10 ns). Under the synergistic effect of VTH compensation and <inline-formula> <tex-math>$\\Delta $ </tex-math></inline-formula>VSN boosting, non-overlap 3-bit storage operation among 25 cells is achieved with one order reduction of standard deviation. This study establishes a critical foundation for implementing multi-bit storage applications of IGZO 2T0C DRAM in large-scale array.","PeriodicalId":13210,"journal":{"name":"IEEE Journal of the Electron Devices Society","volume":"13 ","pages":"439-443"},"PeriodicalIF":2.0000,"publicationDate":"2025-04-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10979978","citationCount":"0","resultStr":"{\"title\":\"IGZO 2T0C DRAM With VTH Compensation Technique for Multi-Bit Applications\",\"authors\":\"Kaifei Chen;Wendong Lu;Jiebin Niu;Menggan Liu;Fuxi Liao;Xuanming Zhang;Zihan Li;Naide Mao;Kaiping Zhang;Congyan Lu;Bok-Moon Kang;Jiawei Wang;Di Geng;Nianduan Lu;Guilei Wang;Zhengyong Zhu;Guanhua Yang;Chao Zhao;Arokia Nathan;Ling Li;Ming Liu\",\"doi\":\"10.1109/JEDS.2025.3565658\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, we proposed and experimentally demonstrated the novel dual-gate (DG) indium-gallium-zinc oxide (IGZO) two-transistor-zero-capacitance (2T0C) dynamic random-access memory (DRAM) for array-level multi-bit storage. Unlike traditional 2T0C DRAM, data writing strategy of the novel DG bit-cell is discharging process from storage node (SN) to bit line, achieving in-cell threshold voltage (VTH) compensation without sacrificing bit-cell layout. VTH modulation derived from the top gate of read transistor makes noticeable <inline-formula> <tex-math>$\\\\Delta $ </tex-math></inline-formula>VSN boosting, with a record-high ratio (<inline-formula> <tex-math>$\\\\Delta $ </tex-math></inline-formula>VSN/<inline-formula> <tex-math>$\\\\Delta $ </tex-math></inline-formula>VDATA) of 1.46, which improves the headroom for multi-bit storage. Moreover, the optimized transistors with positive VTH and high ON-state current enable long retention time (>1500 s) and ultra-fast writing speed (< 10 ns). Under the synergistic effect of VTH compensation and <inline-formula> <tex-math>$\\\\Delta $ </tex-math></inline-formula>VSN boosting, non-overlap 3-bit storage operation among 25 cells is achieved with one order reduction of standard deviation. This study establishes a critical foundation for implementing multi-bit storage applications of IGZO 2T0C DRAM in large-scale array.\",\"PeriodicalId\":13210,\"journal\":{\"name\":\"IEEE Journal of the Electron Devices Society\",\"volume\":\"13 \",\"pages\":\"439-443\"},\"PeriodicalIF\":2.0000,\"publicationDate\":\"2025-04-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10979978\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Journal of the Electron Devices Society\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10979978/\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Journal of the Electron Devices Society","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10979978/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
IGZO 2T0C DRAM With VTH Compensation Technique for Multi-Bit Applications
In this work, we proposed and experimentally demonstrated the novel dual-gate (DG) indium-gallium-zinc oxide (IGZO) two-transistor-zero-capacitance (2T0C) dynamic random-access memory (DRAM) for array-level multi-bit storage. Unlike traditional 2T0C DRAM, data writing strategy of the novel DG bit-cell is discharging process from storage node (SN) to bit line, achieving in-cell threshold voltage (VTH) compensation without sacrificing bit-cell layout. VTH modulation derived from the top gate of read transistor makes noticeable $\Delta $ VSN boosting, with a record-high ratio ($\Delta $ VSN/$\Delta $ VDATA) of 1.46, which improves the headroom for multi-bit storage. Moreover, the optimized transistors with positive VTH and high ON-state current enable long retention time (>1500 s) and ultra-fast writing speed (< 10 ns). Under the synergistic effect of VTH compensation and $\Delta $ VSN boosting, non-overlap 3-bit storage operation among 25 cells is achieved with one order reduction of standard deviation. This study establishes a critical foundation for implementing multi-bit storage applications of IGZO 2T0C DRAM in large-scale array.
期刊介绍:
The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC''s, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original.