{"title":"考虑Peltier效应和Thomson效应的4H-SiC GTO晶闸管修正热模型","authors":"Zihan Zhang;Lei Yuan;Yang Liu;Bo Peng;Weiqun Hou;Peng Dong;Jichao Hu;Fawen Li;Xiaoyan Tang;Renxu Jia;Yuming Zhang","doi":"10.1109/TED.2025.3555258","DOIUrl":null,"url":null,"abstract":"Silicon carbide (SiC) gate turn-off thyristors (GTOs), distinguished by their high current density, high blocking voltage, high switching frequency, and excellent thermal resistance, are highly suitable as pulse switches in pulsed power systems. However, their reliability remains a critical issue requiring urgent attention. Existing research on the thermal failure mechanisms of SiC GTOs is limited, partly due to the neglect of p-n junction voltage effects on thermal distribution. In this work, the Seebeck coefficient (S) in the thermodynamic model is modified, which considers for the first time the previously neglected Peltier and Thomson heats induced by the Seebeck effect in 4H-SiC GTOs. Simulation analysis reveals that the modified model captures localized heat concentration beneath the GTO anode with enhanced accuracy. The modified model predicts approximately <inline-formula> <tex-math>$1\\times 10^{{9}}$ </tex-math></inline-formula> W/cm2 more heat generation within the 6-<inline-formula> <tex-math>$\\mu $ </tex-math></inline-formula>m region beneath the anode. This result highlights the model’s ability to capture the Seebeck effect, which was omitted in the default TCAD model, providing a more accurate representation of the thermal behavior in 4H-SiC GTOs and other bipolar power devices.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 5","pages":"2506-2511"},"PeriodicalIF":2.9000,"publicationDate":"2025-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Modified Thermal Model Considering Peltier Effect and Thomson Effect for 4H-SiC GTO Thyristors\",\"authors\":\"Zihan Zhang;Lei Yuan;Yang Liu;Bo Peng;Weiqun Hou;Peng Dong;Jichao Hu;Fawen Li;Xiaoyan Tang;Renxu Jia;Yuming Zhang\",\"doi\":\"10.1109/TED.2025.3555258\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Silicon carbide (SiC) gate turn-off thyristors (GTOs), distinguished by their high current density, high blocking voltage, high switching frequency, and excellent thermal resistance, are highly suitable as pulse switches in pulsed power systems. However, their reliability remains a critical issue requiring urgent attention. Existing research on the thermal failure mechanisms of SiC GTOs is limited, partly due to the neglect of p-n junction voltage effects on thermal distribution. In this work, the Seebeck coefficient (S) in the thermodynamic model is modified, which considers for the first time the previously neglected Peltier and Thomson heats induced by the Seebeck effect in 4H-SiC GTOs. Simulation analysis reveals that the modified model captures localized heat concentration beneath the GTO anode with enhanced accuracy. The modified model predicts approximately <inline-formula> <tex-math>$1\\\\times 10^{{9}}$ </tex-math></inline-formula> W/cm2 more heat generation within the 6-<inline-formula> <tex-math>$\\\\mu $ </tex-math></inline-formula>m region beneath the anode. This result highlights the model’s ability to capture the Seebeck effect, which was omitted in the default TCAD model, providing a more accurate representation of the thermal behavior in 4H-SiC GTOs and other bipolar power devices.\",\"PeriodicalId\":13092,\"journal\":{\"name\":\"IEEE Transactions on Electron Devices\",\"volume\":\"72 5\",\"pages\":\"2506-2511\"},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2025-04-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Electron Devices\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10955691/\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10955691/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Modified Thermal Model Considering Peltier Effect and Thomson Effect for 4H-SiC GTO Thyristors
Silicon carbide (SiC) gate turn-off thyristors (GTOs), distinguished by their high current density, high blocking voltage, high switching frequency, and excellent thermal resistance, are highly suitable as pulse switches in pulsed power systems. However, their reliability remains a critical issue requiring urgent attention. Existing research on the thermal failure mechanisms of SiC GTOs is limited, partly due to the neglect of p-n junction voltage effects on thermal distribution. In this work, the Seebeck coefficient (S) in the thermodynamic model is modified, which considers for the first time the previously neglected Peltier and Thomson heats induced by the Seebeck effect in 4H-SiC GTOs. Simulation analysis reveals that the modified model captures localized heat concentration beneath the GTO anode with enhanced accuracy. The modified model predicts approximately $1\times 10^{{9}}$ W/cm2 more heat generation within the 6-$\mu $ m region beneath the anode. This result highlights the model’s ability to capture the Seebeck effect, which was omitted in the default TCAD model, providing a more accurate representation of the thermal behavior in 4H-SiC GTOs and other bipolar power devices.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.