Yang Feng;Dong Zhang;Chen Sun;Zijie Zheng;Yue Chen;Qiwen Kong;Gan Liu;Xiaolin Wang;Yuye Kang;Kaizhen Han;Zuopu Zhou;Leming Jiao;Jixuan Wu;Jiezhi Chen;Xiao Gong
{"title":"基于三维fenor内存计算设计的高效大规模神经网络加速","authors":"Yang Feng;Dong Zhang;Chen Sun;Zijie Zheng;Yue Chen;Qiwen Kong;Gan Liu;Xiaolin Wang;Yuye Kang;Kaizhen Han;Zuopu Zhou;Leming Jiao;Jixuan Wu;Jiezhi Chen;Xiao Gong","doi":"10.1109/TED.2025.3554164","DOIUrl":null,"url":null,"abstract":"In this work, we introduce and experimentally demonstrate a 3-D stacked ferroelectric <sc>nor</small> (FeNOR) memory, featuring a back-end-of-line (BEOL) zinc oxide (ZnO) channel, and a metal-ferroelectric–metal-insulator5 semiconductor (MFMIS) unit cell. The main contributions of this work are as follows: 1) enhanced memory window (MW) and high <sc>on</small>/<sc>off</small> ratio: The MFMIS architecture in 3-D FeNOR enables a tunable and large MW (~4 V), as well as an <sc>on</small>/<sc>off</small> ratio (<inline-formula> <tex-math>${I}_{\\text {on}}$ </tex-math></inline-formula>/<inline-formula> <tex-math>${I}_{\\text {off}}$ </tex-math></inline-formula>) of six orders of magnitude; 2) low operation voltage and high endurance: The integration of ferroelectric materials allows for low operation voltages (~4 V) and excellent endurance (<inline-formula> <tex-math>$10^{{7}}$ </tex-math></inline-formula> cycles); 3) efficient neural network implementation: Leveraging the 3-D FeNOR structure, we further develop VGG-16 and ResNet-50 convolutional neural networks that achieve high prediction accuracy, decent area efficiency, and low power consumption. The emergence of 3-D FeNOR technology positions ferroelectric devices as a highly promising candidate for computing-in-memory (CIM) applications.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 5","pages":"2319-2326"},"PeriodicalIF":2.9000,"publicationDate":"2025-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Efficient Large Scale Neural Network Acceleration With 3-D FeNOR-Based Computing-in-Memory Design\",\"authors\":\"Yang Feng;Dong Zhang;Chen Sun;Zijie Zheng;Yue Chen;Qiwen Kong;Gan Liu;Xiaolin Wang;Yuye Kang;Kaizhen Han;Zuopu Zhou;Leming Jiao;Jixuan Wu;Jiezhi Chen;Xiao Gong\",\"doi\":\"10.1109/TED.2025.3554164\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, we introduce and experimentally demonstrate a 3-D stacked ferroelectric <sc>nor</small> (FeNOR) memory, featuring a back-end-of-line (BEOL) zinc oxide (ZnO) channel, and a metal-ferroelectric–metal-insulator5 semiconductor (MFMIS) unit cell. The main contributions of this work are as follows: 1) enhanced memory window (MW) and high <sc>on</small>/<sc>off</small> ratio: The MFMIS architecture in 3-D FeNOR enables a tunable and large MW (~4 V), as well as an <sc>on</small>/<sc>off</small> ratio (<inline-formula> <tex-math>${I}_{\\\\text {on}}$ </tex-math></inline-formula>/<inline-formula> <tex-math>${I}_{\\\\text {off}}$ </tex-math></inline-formula>) of six orders of magnitude; 2) low operation voltage and high endurance: The integration of ferroelectric materials allows for low operation voltages (~4 V) and excellent endurance (<inline-formula> <tex-math>$10^{{7}}$ </tex-math></inline-formula> cycles); 3) efficient neural network implementation: Leveraging the 3-D FeNOR structure, we further develop VGG-16 and ResNet-50 convolutional neural networks that achieve high prediction accuracy, decent area efficiency, and low power consumption. The emergence of 3-D FeNOR technology positions ferroelectric devices as a highly promising candidate for computing-in-memory (CIM) applications.\",\"PeriodicalId\":13092,\"journal\":{\"name\":\"IEEE Transactions on Electron Devices\",\"volume\":\"72 5\",\"pages\":\"2319-2326\"},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2025-04-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Electron Devices\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10957835/\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10957835/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Efficient Large Scale Neural Network Acceleration With 3-D FeNOR-Based Computing-in-Memory Design
In this work, we introduce and experimentally demonstrate a 3-D stacked ferroelectric nor (FeNOR) memory, featuring a back-end-of-line (BEOL) zinc oxide (ZnO) channel, and a metal-ferroelectric–metal-insulator5 semiconductor (MFMIS) unit cell. The main contributions of this work are as follows: 1) enhanced memory window (MW) and high on/off ratio: The MFMIS architecture in 3-D FeNOR enables a tunable and large MW (~4 V), as well as an on/off ratio (${I}_{\text {on}}$ /${I}_{\text {off}}$ ) of six orders of magnitude; 2) low operation voltage and high endurance: The integration of ferroelectric materials allows for low operation voltages (~4 V) and excellent endurance ($10^{{7}}$ cycles); 3) efficient neural network implementation: Leveraging the 3-D FeNOR structure, we further develop VGG-16 and ResNet-50 convolutional neural networks that achieve high prediction accuracy, decent area efficiency, and low power consumption. The emergence of 3-D FeNOR technology positions ferroelectric devices as a highly promising candidate for computing-in-memory (CIM) applications.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.