一维有源通道栅极全能场效应晶体管的室温负差分电阻

IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Amit Verma;Reza Nekovei;Daryoush Shiri
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引用次数: 0

摘要

我们报道了以一维纳米线或纳米管作为有源导电通道的栅极全能场效应晶体管(GAAFET)中存在负差分电阻(NDR)。在这里,漏极电流在相对较高的栅极电压下急剧下降。NDR的起始时间可以根据设备拓扑进行调整。这项工作中的NDR机制是由于施加的栅极电压,而不是漏源电压,这一特性保证了这种效应的低压应用。结果是基于自洽系综蒙特卡罗电荷-载流子输运模型,该模型具有以积分形式求解高斯定律的静电求解器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Room Temperature Negative Differential Resistance in Gate-All-Around Field-Effect Transistors With 1D Active Channels
We report on the presence of a Negative Differential Resistance (NDR) in a Gate-All-Around Field Effect Transistor (GAAFET) with 1D nanowires or nanotubes as the active conducting channel. Here, the drain current is seen to decrease sharply at relatively higher gate voltages. The onset of NDR is tunable with device topology. The NDR mechanism in this work is due to the applied gate voltage, not the drain-source voltage, a feature which promises low-voltage application of this effect. The results are based on a self-consistent ensemble Monte Carlo charge-carrier transport model with an electrostatic solver that solves Gauss's law in integral form.
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来源期刊
IEEE Transactions on Nanotechnology
IEEE Transactions on Nanotechnology 工程技术-材料科学:综合
CiteScore
4.80
自引率
8.30%
发文量
74
审稿时长
8.3 months
期刊介绍: The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.
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