线性实验先进装置中平面多环天线的阻抗测量

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2025-04-15 DOI:10.1109/TPS.2025.3554760

Zhi Li;Lingfeng Lu;Chenggonghang Zhou;Chao Wang;Hao Liu;Lei Chang;Dan Du;Huaiqing Zhang

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引用次数: 0

摘要

线性实验先进装置（LEAD）是在西南物理研究所建造的，旨在研究基础等离子体物理，并作为射频（RF）诊断的试验台。LEAD采用螺旋等离子体源，采用特殊设计的平面多环天线。为了实时监测天线阻抗，研制了一种电压-电流探头。首先给出了自制V-I探头对天线阻抗的测量结果。探讨了天线阻抗随射频功率、磁场和气体流速的变化规律。并将自制V-I探针测得的天线阻抗与商用V-I套装进行了比较。这些天线阻抗的测量可以为铅中螺旋波耦合的研究提供必要的信息。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Impedance Measurement of the Planar Multiring Antenna in the Linear Experimental Advanced Device

The linear experimental advanced device (LEAD) was built at the Southwestern Institute of Physics, aiming to study fundamental plasma physics and serve as a testbed for radio frequency (RF) diagnostics. LEAD equips a helicon plasma source, which adopts a specially designed planar multiring antenna. In order to monitor in real time the antenna impedance, a voltage-current (V–I) probe was developed. First, the results of the antenna impedance measurement by the homemade V–I probe are given. The variations of the antenna impedance with respect to the RF power, magnetic field, and gas flow rate are explored. The antenna impedances measured by the homemade V–I probe are further compared with the commercial V–I suit. These measurements of the antenna impedance could provide essential information to the helicon wave coupling studies in LEAD.

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.