银纳米薄膜局部激发表面等离子激元诱导扫描近场光刻

IF 4.6 2区 物理与天体物理 Q1 OPTICS
Xuewen Wang , Xuesong Mei , Hailong Yin , Zhijun Wang , Xiaoqiao He , Jianlei Cui
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引用次数: 0

摘要

扫描近场光学光刻技术(SNOL)以其低成本和稳定的优点被认为是亚衍射极限纳米加工的一种优秀技术。本文报道了利用悬臂式扫描近场光学显微镜(SNOM)尖端和纳秒激光,在银纳米薄膜上可控地产生高精度的凹槽和图案特征。形貌和元素分析表明,表面材料的熔化和重塑是SNOL在Ag纳米薄膜上的作用机理。采用有限元法建立了多物理场模型,计算了电磁场和热场的分布。模拟结果表明,局部激发的表面等离子激元(SPPs)引起了光场的近场增强,并产生了限制在尖端孔径内的椭圆热点。在光刻工艺中,单脉冲能量和入射激光的偏振是至关重要的参数。这些参数对特征宽度的理论影响机制与实验结果一致。该技术在纳米结构加工和纳米焊接中具有极小范围和高瞬时能量的热点效应,具有广阔的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Locally excited surface plasmon polaritons (SPPs) induced scanning near-field optical lithography on Ag nano-film
Scanning near-field optical lithography (SNOL) has been considered an outstanding technique for sub-diffraction-limit nanofabrication since the advantages of low-cost and stability. Here, we report the SNOL on Ag nano-film to generate high-accuracy groove and pattern features controllably, using a cantilevered scanning near-field optical microscopy (SNOM) tip and nanosecond laser. The morphology and element analysis of fabricated features indicate that the melting and reshaping of the surface materials are the mechanism of SNOL on Ag nano-film. The electromagnetic filed and thermal field distributions are calculated via a multi-physics model by finite element method (FEM). The simulation reveals that the locally excited surface plasmon polaritons (SPPs) induce the near-field enhancement of light field and produce elliptical hot spot confined in the tip aperture. Single pulse energy and polarization of the incident laser are demonstrated to be essential parameters in lithography. The theoretical influential mechanism of these parameters to the feature width is consistent with experimental results. Due to the hot spot effect with extremely small range and high instantaneous energy underneath the tip aperture, this technology has immense potential in nanostructure processing and nano-welding in the future.
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来源期刊
CiteScore
8.50
自引率
10.00%
发文量
1060
审稿时长
3.4 months
期刊介绍: Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems
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