湿热耦合条件下三维封装存储器可靠性研究

IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Shuai Zhou , Kaixue Ma , Shoufu Liu , Chi Ma
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引用次数: 0

摘要

随着3D封装等先进封装技术的广泛采用,研究耦合湿热应力对采用这些新型封装技术的微电子器件可靠性的影响变得越来越重要。本文以三维封装存储模块为研究对象,采用有限元仿真和实验验证的方法,对三维封装器件在耦合湿热应力作用下的可靠性进行了研究和分析。研究结果表明,三维封装存储器的散热孔是水分进入存储器的主要入口。这些通风口附近的区域受到耦合湿热应力的显著影响。在耦合湿热应力作用下,包封材料容易发生破坏,而内部结构相对不受影响。Kirkendall空洞出现在3D封装存储器内部互连的一些焊点上。连续暴露在高温高湿条件下,伴随着耦合湿热应力,加速了原子扩散,导致更多的空位向已经形成的空隙迁移,从而促进这些空隙的持续膨胀。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability study of 3D packaged memory under coupled damp and thermal conditions
With the widespread adoption of advanced packaging technologies such as 3D packaging, it has become increasingly important to study the impact of coupled hygrothermal stress on the reliability of microelectronic devices employing these novel packaging techniques. This paper employs finite element simulation and experimental validation, focusing on 3D packaged memory modules, to investigate and analyze the reliability of 3D packaged devices under coupled hygrothermal stress. The research results indicate that the heat dissipation vents of 3D packaged memories serve as the primary entry points for moisture. The areas near these vents are significantly affected by coupled hygrothermal stress. The encapsulant material is prone to failure under the action of coupled hygrothermal stress, while the internal structure remains relatively unaffected. Kirkendall voids appear in some of the solder joints within the internal interconnects of the 3D packaged memories. The continuous exposure to high temperature and high humidity conditions associated with coupled hygrothermal stress accelerates atomic diffusion, leading to the generation of more vacancies that migrate towards the already formed voids, thereby promoting the continuous expansion of these voids.
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来源期刊
Microelectronics Reliability
Microelectronics Reliability 工程技术-工程:电子与电气
CiteScore
3.30
自引率
12.50%
发文量
342
审稿时长
68 days
期刊介绍: Microelectronics Reliability, is dedicated to disseminating the latest research results and related information on the reliability of microelectronic devices, circuits and systems, from materials, process and manufacturing, to design, testing and operation. The coverage of the journal includes the following topics: measurement, understanding and analysis; evaluation and prediction; modelling and simulation; methodologies and mitigation. Papers which combine reliability with other important areas of microelectronics engineering, such as design, fabrication, integration, testing, and field operation will also be welcome, and practical papers reporting case studies in the field and specific application domains are particularly encouraged. Most accepted papers will be published as Research Papers, describing significant advances and completed work. Papers reviewing important developing topics of general interest may be accepted for publication as Review Papers. Urgent communications of a more preliminary nature and short reports on completed practical work of current interest may be considered for publication as Research Notes. All contributions are subject to peer review by leading experts in the field.
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