扫描电镜成像纳米颗粒单层的光谱参数化

IF 5.2 2区 工程技术 Q1 ENGINEERING, MULTIDISCIPLINARY
Paweł Weroński
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引用次数: 0

摘要

在Measurement 241(2025) 115692中发表的计算机生成的颗粒单层图像的分析表明,该论文中描述的单层参数化的新方法对表观粒径的扭曲不敏感。在这篇简短的文章中,我们在文献中发表的SEM显微照片上证明,在溅射涂层颗粒单层的真实、不完美的显微图像中,这一特征也被保留了下来。为此,我们使用显微照片,使四个图像在不同程度的畸变在表观粒度。对四幅图像进行的最小二乘拟合显示,确定的颗粒大小和表面覆盖率的差异在统计上不显著。对四个数据集进行的单因素方差分析显示,它们的平均值在统计上是相等的。为四个数据集中的六对计算的Pearson相关系数表明,这些数据集之间存在很强的线性关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

The spectral parametrization of a SEM imaged nanoparticle monolayer

The spectral parametrization of a SEM imaged nanoparticle monolayer
The analysis of computer-generated particle-monolayer images, presented in Measurement 241 (2025) 115692, shows that the novel method of monolayer parametrization described in that paper is insensitive to distortions in apparent particle size. In this short communication, we demonstrate on a SEM micrograph published in the literature that this feature is also preserved in the case of real, imperfect microscopic images of sputter-coated particle monolayers. For this purpose, we use the micrograph to make four images at different degrees of distortion in apparent particle size. Least-squares fitting performed for the four images reveals that the differences in the determined particle size and surface coverage are statistically insignificant. One-way ANOVA performed on the four data sets shows that their means are statistically equal. The Pearson correlation coefficients calculated for the six pairs of the four data sets indicate a strong linear relationship between the sets.
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来源期刊
Measurement
Measurement 工程技术-工程:综合
CiteScore
10.20
自引率
12.50%
发文量
1589
审稿时长
12.1 months
期刊介绍: Contributions are invited on novel achievements in all fields of measurement and instrumentation science and technology. Authors are encouraged to submit novel material, whose ultimate goal is an advancement in the state of the art of: measurement and metrology fundamentals, sensors, measurement instruments, measurement and estimation techniques, measurement data processing and fusion algorithms, evaluation procedures and methodologies for plants and industrial processes, performance analysis of systems, processes and algorithms, mathematical models for measurement-oriented purposes, distributed measurement systems in a connected world.
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