{"title":"采用斜角沉积技术实现了低成本、平均消光比为40 dB的丝栅偏振片","authors":"Xingwei Liu, Zefan Lin, Zhehao Zhang, Yuwei Chai, Lingxue Wang, Guoguo Kang","doi":"10.1016/j.optlastec.2025.113099","DOIUrl":null,"url":null,"abstract":"<div><div>Classical metal wire grid polarizers are commonly employed as infrared polarizers due to their broad operating spectrum. However, their low extinction ratio limits applications in high-precision infrared polarization in short-wavelength infrared range. Analysis using the Rigorous Coupled Wave Analysis indicates that the extinction ratio of a metal wire grid polarizer is positively correlated with the depth of the metal grating layer. Traditional etching and lift-off methods are insufficient for achieving the necessary depth to realize a high extinction ratio. In this paper, we propose an approach to fabricate infrared wire grid polarizers with ultra-high extinction ratios by combining Laser Interference Lithography with Oblique Angled Deposition method. The wire grid polarizer has a periodic structure of 300 nm and a grating layer depth of 450 nm, with an aspect ratio of 3:1. Experimental results demonstrate that the average transmission for TM wave exceeds 70 %, while the average extinction ratio surpasses 40 dB (10000:1) within the 1 μm to 2.5 μm range. The wire grid polarizer fabricated using the simple and low-cost methods has the potential to become a commercially viable product.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"189 ","pages":"Article 113099"},"PeriodicalIF":4.6000,"publicationDate":"2025-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A low-cost wire grid polarizer with an average extinction ratio of 40 dB in SWIR range realized by oblique angled deposition\",\"authors\":\"Xingwei Liu, Zefan Lin, Zhehao Zhang, Yuwei Chai, Lingxue Wang, Guoguo Kang\",\"doi\":\"10.1016/j.optlastec.2025.113099\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Classical metal wire grid polarizers are commonly employed as infrared polarizers due to their broad operating spectrum. However, their low extinction ratio limits applications in high-precision infrared polarization in short-wavelength infrared range. Analysis using the Rigorous Coupled Wave Analysis indicates that the extinction ratio of a metal wire grid polarizer is positively correlated with the depth of the metal grating layer. Traditional etching and lift-off methods are insufficient for achieving the necessary depth to realize a high extinction ratio. In this paper, we propose an approach to fabricate infrared wire grid polarizers with ultra-high extinction ratios by combining Laser Interference Lithography with Oblique Angled Deposition method. The wire grid polarizer has a periodic structure of 300 nm and a grating layer depth of 450 nm, with an aspect ratio of 3:1. Experimental results demonstrate that the average transmission for TM wave exceeds 70 %, while the average extinction ratio surpasses 40 dB (10000:1) within the 1 μm to 2.5 μm range. The wire grid polarizer fabricated using the simple and low-cost methods has the potential to become a commercially viable product.</div></div>\",\"PeriodicalId\":19511,\"journal\":{\"name\":\"Optics and Laser Technology\",\"volume\":\"189 \",\"pages\":\"Article 113099\"},\"PeriodicalIF\":4.6000,\"publicationDate\":\"2025-05-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optics and Laser Technology\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0030399225006905\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics and Laser Technology","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0030399225006905","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}
A low-cost wire grid polarizer with an average extinction ratio of 40 dB in SWIR range realized by oblique angled deposition
Classical metal wire grid polarizers are commonly employed as infrared polarizers due to their broad operating spectrum. However, their low extinction ratio limits applications in high-precision infrared polarization in short-wavelength infrared range. Analysis using the Rigorous Coupled Wave Analysis indicates that the extinction ratio of a metal wire grid polarizer is positively correlated with the depth of the metal grating layer. Traditional etching and lift-off methods are insufficient for achieving the necessary depth to realize a high extinction ratio. In this paper, we propose an approach to fabricate infrared wire grid polarizers with ultra-high extinction ratios by combining Laser Interference Lithography with Oblique Angled Deposition method. The wire grid polarizer has a periodic structure of 300 nm and a grating layer depth of 450 nm, with an aspect ratio of 3:1. Experimental results demonstrate that the average transmission for TM wave exceeds 70 %, while the average extinction ratio surpasses 40 dB (10000:1) within the 1 μm to 2.5 μm range. The wire grid polarizer fabricated using the simple and low-cost methods has the potential to become a commercially viable product.
期刊介绍:
Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication.
The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas:
•development in all types of lasers
•developments in optoelectronic devices and photonics
•developments in new photonics and optical concepts
•developments in conventional optics, optical instruments and components
•techniques of optical metrology, including interferometry and optical fibre sensors
•LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow
•applications of lasers to materials processing, optical NDT display (including holography) and optical communication
•research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume)
•developments in optical computing and optical information processing
•developments in new optical materials
•developments in new optical characterization methods and techniques
•developments in quantum optics
•developments in light assisted micro and nanofabrication methods and techniques
•developments in nanophotonics and biophotonics
•developments in imaging processing and systems