Verônica de M. Andrade , Sávio M. Lopes , Rafael A. Raimundo , Ricardo F. Alves , Allan J.M. Araújo , Pamala S. Vieira , Fausthon F. da Silva , Marco A. Morales , Daniel A. Macedo , Duncan P. Fagg , Glageane da S. Souza
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引用次数: 0
摘要
考虑到对可再生能源日益增长的需求,以及在纳米颗粒材料生产中寻找可持续的替代品,这项工作报道了新的镍、共氧化物纳米颗粒作为析氧反应(OER)的电催化剂。以红藻(Rhodophyta)中的琼脂为聚合剂,采用蛋白质溶胶-凝胶法制备了Ni、co基纳米颗粒,并利用x射线衍射(包括Rietveld精化)、场发射扫描电镜和振动光谱(红外和拉曼光谱)对纳米颗粒进行了表征。结构分析表明,得到了NiO、Ni0.9Co0.1O和(Ni,Co)O-Co3O4晶相。采用电化学技术研究了OER电催化性能,(Ni,Co)O-Co3O4电催化剂在J = 10 mA cm−2时表现出最低的过电位(356 mV vs. RHE),在500 mV vs. RHE时的周转频率(TOF)为9.97 × 10−3 mol O2 s−1。此外,所有制备的电催化剂在15小时内都表现出优异的化学稳定性,如时间电位测定数据所示。
Green synthesis of Ni, Co-based oxides for water oxidation applications
This work reports new Ni,Co-oxides based nanoparticles as electrocatalysts for the Oxygen Evolution Reaction (OER), considering the growing demand for renewable energy, as well as the search for sustainable alternatives in the production of nanoparticle materials. Ni,Co-based nanoparticles were obtained via proteic sol-gel method, with Agar-Agar from red seaweed (Rhodophyta) as polymerizing agent, and characterized by using X-ray diffraction techniques (including Rietveld refinement), Field emission scanning electron microscopy and vibrational spectroscopy (infrared and Raman). All structural analyses indicated that the crystalline phases NiO, Ni0.9Co0.1O and (Ni,Co)O-Co3O4 were obtained. Electrochemical techniques were applied to investigate the OER electrocatalytic performance, with the (Ni,Co)O-Co3O4 electrocatalyst showing the lowest overpotential (356 mV vs. RHE at J = 10 mA cm−2) and a Turnover Frequency (TOF) of 9.97 × 10−3 mol O2 s−1 at just 500 mV vs. RHE. Furthermore, all prepared electrocatalysts showed excellent chemical stability up to 15 h, as indicated in chronopotentiometry data.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.