一种用于自身免疫性疾病检测的新型衬底金属条负载无掺杂异质结(GaSb/Si) TFET生物传感器

IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Madhulika Verma;Sachin Agrawal
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引用次数: 0

摘要

在人类中,自身免疫性疾病是由免疫系统攻击身体组织引起的。因此,迫切需要先进的诊断工具来早期准确地发现它们。本研究介绍了一种具有优异灵敏度和性能的新型衬底金属条加载无掺杂异质结(GaSb/Si) TFET生物传感器(UMS-DL-HJ-TFETB)器件。关键的设计特点包括一个衬底金属条,用于改善隧道掘进,空腔位于源区,在k = 12和V$ {gs}$ = 0.45 V时实现6.7 × 10${10}$的峰值漏极电流灵敏度。该生物传感器的截止频率为3.27 × 10$^{8}$ Hz,响应时间为496 ps,具有优异的射频性能。研究了器件在检测$\pm$1 × 10$^{11}$ cm$^{-2}$到$\pm$1 × 10$^{12}$ cm$^{-2}$范围内的DNA电荷密度的性能。此外,还对由位阻效应引起的五种不均匀分布进行了优化。为了公平评价,还进行了对比分析。仿真结果表明,所提出的生物传感器解决了传统方法的局限性,对自身免疫性疾病具有高灵敏度、快速检测和可靠的诊断准确性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Novel Underlay Metal Strip Loaded Doping-Less Heterojunction (GaSb/Si) TFET Biosensor for Autoimmune Disease Detection
In human being autoimmune diseases are caused by the immune system's attack on body tissues. Therefore, advanced diagnostic tools for their early and accurate detection is highly needed. This study introduces a new underlay metal strip loaded doping-less heterojunction (GaSb/Si) TFET biosensor (UMS-DL-HJ-TFETB) device with exceptional sensitivity and performance. Key design features include an underlay metal strip for improved tunnelling and the cavities are on the source region to achieve a peak drain current sensitivity of 6.7 × 10$^{10}$ at k = 12 and V$_{gs}$ = 0.45 V. With a cut-off frequency of 3.27 × 10$^{8}$ Hz and a response time of 496 ps, the proposed biosensor exhibits excellent RF performance. The device performance in detecting DNA charge densities ranging from $\pm$1 × 10$^{11}$ cm$^{-2}$ to $\pm$1 × 10$^{12}$ cm$^{-2}$ has also been studied. In addition, five non-uniform distributions which is caused by the steric hindrance effect have been optimized. A comparative analysis is also done for fair evaluation. The simulation results show that the proposed biosensor addresses the limitations of conventional methods, providing high sensitivity, rapid detection and reliable diagnostic accuracy for autoimmune diseases.
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来源期刊
IEEE Transactions on Nanotechnology
IEEE Transactions on Nanotechnology 工程技术-材料科学:综合
CiteScore
4.80
自引率
8.30%
发文量
74
审稿时长
8.3 months
期刊介绍: The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.
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