操作低至4.2开尔文的无结纳米线晶体管

IF 1.4 4区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
F.E. Bergamaschi , J.A. Matos , M. de Souza , S. Barraud , M. Cassé , O. Faynot , M.A. Pavanello
{"title":"操作低至4.2开尔文的无结纳米线晶体管","authors":"F.E. Bergamaschi ,&nbsp;J.A. Matos ,&nbsp;M. de Souza ,&nbsp;S. Barraud ,&nbsp;M. Cassé ,&nbsp;O. Faynot ,&nbsp;M.A. Pavanello","doi":"10.1016/j.sse.2025.109133","DOIUrl":null,"url":null,"abstract":"<div><div>In this work, an experimental characterization of SOI junctionless nanowire transistors operating in liquid helium temperature is conducted. DC measurements are performed in a temperature range from 300 K down to 4.2 K in devices with variable geometrical dimensions, namely the gate length and the fin width. Different electrical parameters are analyzed, such as the threshold voltage, the subthreshold slope, the low-field mobility, and the drain-induced barrier lowering (DIBL). The temperature reduction helps partially suppress short-channel effects, leading to improvement in these parameters while preserving good electrostatic control, even for highly scaled channel lengths.</div></div>","PeriodicalId":21909,"journal":{"name":"Solid-state Electronics","volume":"228 ","pages":"Article 109133"},"PeriodicalIF":1.4000,"publicationDate":"2025-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Operation of junctionless nanowire transistors down to 4.2 Kelvin\",\"authors\":\"F.E. Bergamaschi ,&nbsp;J.A. Matos ,&nbsp;M. de Souza ,&nbsp;S. Barraud ,&nbsp;M. Cassé ,&nbsp;O. Faynot ,&nbsp;M.A. Pavanello\",\"doi\":\"10.1016/j.sse.2025.109133\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>In this work, an experimental characterization of SOI junctionless nanowire transistors operating in liquid helium temperature is conducted. DC measurements are performed in a temperature range from 300 K down to 4.2 K in devices with variable geometrical dimensions, namely the gate length and the fin width. Different electrical parameters are analyzed, such as the threshold voltage, the subthreshold slope, the low-field mobility, and the drain-induced barrier lowering (DIBL). The temperature reduction helps partially suppress short-channel effects, leading to improvement in these parameters while preserving good electrostatic control, even for highly scaled channel lengths.</div></div>\",\"PeriodicalId\":21909,\"journal\":{\"name\":\"Solid-state Electronics\",\"volume\":\"228 \",\"pages\":\"Article 109133\"},\"PeriodicalIF\":1.4000,\"publicationDate\":\"2025-04-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Solid-state Electronics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0038110125000784\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid-state Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0038110125000784","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

摘要

本文对在液氦温度下工作的SOI无结纳米线晶体管进行了实验表征。在具有可变几何尺寸(即栅极长度和鳍片宽度)的器件中,在300 K至4.2 K的温度范围内进行直流测量。分析了不同的电参数,如阈值电压、亚阈值斜率、低场迁移率和漏极势垒降低(DIBL)。温度降低有助于部分抑制短通道效应,从而改善这些参数,同时保持良好的静电控制,即使对于高度缩放的通道长度也是如此。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Operation of junctionless nanowire transistors down to 4.2 Kelvin
In this work, an experimental characterization of SOI junctionless nanowire transistors operating in liquid helium temperature is conducted. DC measurements are performed in a temperature range from 300 K down to 4.2 K in devices with variable geometrical dimensions, namely the gate length and the fin width. Different electrical parameters are analyzed, such as the threshold voltage, the subthreshold slope, the low-field mobility, and the drain-induced barrier lowering (DIBL). The temperature reduction helps partially suppress short-channel effects, leading to improvement in these parameters while preserving good electrostatic control, even for highly scaled channel lengths.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Solid-state Electronics
Solid-state Electronics 物理-工程:电子与电气
CiteScore
3.00
自引率
5.90%
发文量
212
审稿时长
3 months
期刊介绍: It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信