Joao Antonio Martino , Paula Ghedini Der Agopian , Julius Andretti Peixoto Pires de Paula , Romain Ritzenthaler , Hans Mertens , Anabela Veloso , Naoto Horiguchi
{"title":"高温下叉片场效应管的模拟行为","authors":"Joao Antonio Martino , Paula Ghedini Der Agopian , Julius Andretti Peixoto Pires de Paula , Romain Ritzenthaler , Hans Mertens , Anabela Veloso , Naoto Horiguchi","doi":"10.1016/j.sse.2025.109139","DOIUrl":null,"url":null,"abstract":"<div><div>This work presents an experimental study of the analog behavior of forksheet FET from room up to 150 °C with channel lengths of 26 and 70 nm. These devices present a Zero Temperature-Coefficient (ZTC) point for a gate voltage around 0,59 V (V<sub>ZTC</sub>) in saturation region. The threshold voltage variation with temperature (dV<sub>T</sub>/dT) is around −0,5mV/<sup>o</sup>C due to the Fermi level decrease. The DIBL increases with temperature but it is kept lower than 51 mV/V in the studied temperature range. The transconductance and output conductance decrease (mainly due the mobility degradation) which results in a good intrinsic voltage gain of around 36 dB at room temperature, showing a slight change (±2dB) in the studied temperature range. The maximum unity gain frequency estimated for L = 26 nm is around 358 GHz in strong inversion regime. The results show that the forksheet FETs present a good performance for analog applications at high temperature, which in addition to the already known savings in footprint area compared to nanosheet technology, are potentially useful for future mixed-signal integrated circuits.</div></div>","PeriodicalId":21909,"journal":{"name":"Solid-state Electronics","volume":"227 ","pages":"Article 109139"},"PeriodicalIF":1.4000,"publicationDate":"2025-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Analog behavior of forksheet FET at high temperatures\",\"authors\":\"Joao Antonio Martino , Paula Ghedini Der Agopian , Julius Andretti Peixoto Pires de Paula , Romain Ritzenthaler , Hans Mertens , Anabela Veloso , Naoto Horiguchi\",\"doi\":\"10.1016/j.sse.2025.109139\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This work presents an experimental study of the analog behavior of forksheet FET from room up to 150 °C with channel lengths of 26 and 70 nm. These devices present a Zero Temperature-Coefficient (ZTC) point for a gate voltage around 0,59 V (V<sub>ZTC</sub>) in saturation region. The threshold voltage variation with temperature (dV<sub>T</sub>/dT) is around −0,5mV/<sup>o</sup>C due to the Fermi level decrease. The DIBL increases with temperature but it is kept lower than 51 mV/V in the studied temperature range. The transconductance and output conductance decrease (mainly due the mobility degradation) which results in a good intrinsic voltage gain of around 36 dB at room temperature, showing a slight change (±2dB) in the studied temperature range. The maximum unity gain frequency estimated for L = 26 nm is around 358 GHz in strong inversion regime. The results show that the forksheet FETs present a good performance for analog applications at high temperature, which in addition to the already known savings in footprint area compared to nanosheet technology, are potentially useful for future mixed-signal integrated circuits.</div></div>\",\"PeriodicalId\":21909,\"journal\":{\"name\":\"Solid-state Electronics\",\"volume\":\"227 \",\"pages\":\"Article 109139\"},\"PeriodicalIF\":1.4000,\"publicationDate\":\"2025-04-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Solid-state Electronics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S003811012500084X\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid-state Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S003811012500084X","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Analog behavior of forksheet FET at high temperatures
This work presents an experimental study of the analog behavior of forksheet FET from room up to 150 °C with channel lengths of 26 and 70 nm. These devices present a Zero Temperature-Coefficient (ZTC) point for a gate voltage around 0,59 V (VZTC) in saturation region. The threshold voltage variation with temperature (dVT/dT) is around −0,5mV/oC due to the Fermi level decrease. The DIBL increases with temperature but it is kept lower than 51 mV/V in the studied temperature range. The transconductance and output conductance decrease (mainly due the mobility degradation) which results in a good intrinsic voltage gain of around 36 dB at room temperature, showing a slight change (±2dB) in the studied temperature range. The maximum unity gain frequency estimated for L = 26 nm is around 358 GHz in strong inversion regime. The results show that the forksheet FETs present a good performance for analog applications at high temperature, which in addition to the already known savings in footprint area compared to nanosheet technology, are potentially useful for future mixed-signal integrated circuits.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.