Co掺杂Bi2Se3拓扑绝缘体:理论与实验相结合的研究

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Ravi Kumar , D.S. Sisodiya , Kritika Vijay , Soma Banik , Shashwati Sen , P.D. Babu , Dibyendu Bhattacharyya
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引用次数: 0

摘要

磁离子掺杂在Bi2Se3等拓扑绝缘体中的研究正迅速得到重视,因为它具有前瞻性的技术意义,并且在奇异的基本物理概念的实验验证中具有重要意义。在这项研究中,我们通过结合先进的从头算密度泛函理论(DFT)计算和一系列实验技术,包括x射线衍射(XRD)、x射线吸收光谱(XAS)和角分辨光发射光谱(ARPES),利用同步辐射对共掺杂Bi2Se3进行了全面的研究。这种详细的方法超越了以前的研究,不仅确认了长程晶体秩序,而且提供了对Co掺杂剂周围局部原子环境和电子结构的详细见解。我们的理论和实验研究毫无疑问地揭示了Co原子优先占据范德华间隙内的间隙位,这一结果为Co在Bi2Se3中掺杂的首选位置提供了决定性的明确。除此之外,我们的理论研究得到了实验结果的证实,也解释了Co掺杂对Bi2Se3磁性能的影响。这种对掺杂剂位置偏好、氧化态和由此产生的磁性行为之间相互作用的增强理解,对于设计具有优化性能的下一代拓扑绝缘体基器件至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Co doped Bi2Se3 topological insulator: a combined theoretical and experimental study
Research on magnetic ion doping in topological insulators like Bi2Se3 is gaining prominence rapidly since it has prospective technological implications and also has significant importance in experimental verification of exotic fundamental physical concepts. In this study, we present a comprehensive investigation of Co-doped Bi2Se3 by integrating advanced ab initio density functional theory (DFT) calculations with an array of experimental techniques including X-ray diffraction (XRD), X-ray absorption spectroscopy (XAS) and angle-resolved photoemission spectroscopy (ARPES) using synchrotron radiation. This detailed approach goes beyond previous research by not only confirming the long-range crystalline order but also providing a detailed insight into the local atomic environment and electronic structure around Co dopants. Our combined theoretical and experimental investigations undoubtedly reveal that Co atoms preferentially occupy interstitial sites within the van der Waals gap, a result which has provided conclusive clarity regarding the preferred sites for Co doping in Bi2Se3. Apart from the above, our theoretical study corroborated by experimental results also explains how Co doping affects magnetic properties of Bi2Se3. This enhanced understanding of the interplay between dopant site preference, oxidation state, and resultant magnetic behavior is pivotal for designing next generation topological insulator-based devices with optimized performance.
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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