空心阴极支持的无侧壁放电的局部等离子体参数

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
A. V. Bernatskiy, I. I. Draganov, N. A. Dyatko, I. V. Kochetov, V. V. Lagunov, V. N. Ochkin
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引用次数: 0

摘要

利用Langmuir探针方法,研究了减压氦气中矩形空心阴极支撑放电过程中等离子体参数(等离子体势、电子数密度和平均电子能)的空间分布。测量既在阴极和阳极之间的几何孔径内进行,也在其外部进行,包括阳极后面的区域。在实验中,使用了不同的阳极设计:矩形金属栅格和相邻固体金属或介电板的栅格。结果表明,在阳极后面的区域有明显的电子数密度,在栅极阳极中观察到最高的电子数密度。利用沿栅极放电间隙中心轴X测量的电场分量Ex(X),在一维蒙特卡罗模型中计算了电子数密度分布Ne(X)。在阴极-阳极间隙处,计算结果与实验数据吻合较好,而在阳极间隙处,计算结果明显低于实测值。这种差异可以用这样一个事实来解释:在实验条件下,一些电子进入这个区域不是通过飞过栅极阳极,而是通过绕栅极阳极飞行。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Local Plasma Parameters of a Discharge Without Sidewalls Supported by a Hollow Cathode

Using the Langmuir probe method, the spatial distributions of plasma parameters (plasma potential, electron number density and mean electron energy) in a discharge supported by a rectangular hollow cathode in helium at reduced pressure were studied. Measurements were carried out both inside the geometric aperture between the cathode and the anode, and outside it, including the region behind the anode. In the experiments, different anode designs were used: a rectangular metal grid and a grid with an adjacent solid metal or dielectric plate. It is shown that there is a noticeable number density of electrons in the region behind the anode, and the highest is observed in the case of a grid anode. Using the electric field component Ex(х), measured along the central axis X of the discharge gap for the case of grid anode, electron number density profile Ne(x) was calculated within the 1D Monte Carlo model. In the cathode-anode gap, the calculation results agree satisfactorily with the experimental data, but behind the anode, they are significantly lower than those measured. This difference is explained by the fact that under experimental conditions some of the electrons enter this region not by flying through the grid anode, but by flying around it.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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