用于 3000 K 以上介电性能测量的热等离子体诱导高温绝缘气体生成技术

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Koya Ishinokoshi, Rio Okano, Yasunori Tanaka, Tatsuo Ishijima, Yusuke Nakano
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引用次数: 0

摘要

提出了一种利用串联型电感耦合热等离子体(Tandem-ICTP)产生高温气体的新方法,该方法由两个垂直排列的线圈组成,用于实验评估热气体的介电特性。高温绝缘气体的介电性能是决定气体断路器断流成败的关键。在本研究中,我们重点对Tandem-ICTP高温气田进行了详细研究。通过改变Tandem-ICTP系统的下线圈输入功率来加热\(\hbox {CO}_2\)气体的温度,使用Boltzmann图方法在电极位置使用光谱测量来估计。此外,还进行了电磁热流体模拟,以支持实验测量的温度,并估计电极之间\(\hbox {CO}_2\)气体的摩尔浓度。结果表明,使用Tandem-ICTP, \(\hbox {CO}_2\)气体的温度可以超过3800 K,并且可以通过改变下线圈的输入功率来调节大约2600 K。此外,通过数值模拟发现,电极之间的高温\(\hbox {CO}_2\)气体的摩尔浓度约为40 \(\%\)。该方法表明,通过控制串联- ictp系统下线圈输入功率等参数,可以在3000 K以上的大范围高温气田中进行介电测试。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thermal Plasma-Induced High Temperature Insulation Gas Generation for Dielectric Property Measurement above 3000 K

A novel method for generating high-temperature gas using a tandem-type inductively coupled thermal plasma (Tandem-ICTP), composed of two vertically arranged coils, was proposed to experimentally evaluate the dielectric properties of hot gases. The dielectric properties of high-temperature insulation gases are critical for determining the success or failure of current interruption in gas circuit breakers (GCBs). In this study, we focused on the detailed investigation of the high-temperature gas field generated by Tandem-ICTP. The temperature of \(\hbox {CO}_2\) gas, heated by varying the lower-coil input power in the Tandem-ICTP system, was estimated using spectroscopic measurements at the electrode position, applying the Boltzmann plot method. Additionally, an electromagnetic thermofluid simulation was conducted to support the experimentally measured temperatures and to estimate the mole concentration of \(\hbox {CO}_2\) gas between the electrodes. The results revealed that the temperature of the \(\hbox {CO}_2\) gas could exceed 3800 K using the Tandem-ICTP and could be adjusted by approximately 2600 K by modifying the input power of lower-coil. Furthermore, the mole concentration of high-temperature \(\hbox {CO}_2\) gas between the electrodes was found to be approximately 40\(\%\), as determined by numerical simulation. This method demonstrates that a dielectric test can be conducted in the wide range of high-temperature gas fields above 3000 K by controlling parameters such as the input power of lower-coil in the Tandem-ICTP system.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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