{"title":"Fabrication and characterization of structural, morphology and electrical properties of thermally deposited quinacridone thin films","authors":"Tengyue Zhang , Hiroto Segawa , Rongbin Ye","doi":"10.1016/j.tsf.2025.140670","DOIUrl":null,"url":null,"abstract":"<div><div>In this paper, we have systematically reported on fabrication and characterization of structural, morphology and electrical properties of thermally deposited Quinacridone (QA) thin films through controlling the substrate temperature. By the detailed X-ray diffraction and atomic force microscopy analysis, QA thin films were crystallized at a substrate temperature of 80 °C or higher. At the substate temperature of 180 °C, highly ordering β phase QA thin films could be deposited with the largest gain size of ca. 232 nm and the maximum mobility of 2.95 × 10<sup>–2</sup> cm<sup>2</sup> /V s can be obtained. Thus, the grain sizes and phase selecting growth of the QA thin films could be controlled by the substrate temperature.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"819 ","pages":"Article 140670"},"PeriodicalIF":2.0000,"publicationDate":"2025-03-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0040609025000719","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
Fabrication and characterization of structural, morphology and electrical properties of thermally deposited quinacridone thin films
In this paper, we have systematically reported on fabrication and characterization of structural, morphology and electrical properties of thermally deposited Quinacridone (QA) thin films through controlling the substrate temperature. By the detailed X-ray diffraction and atomic force microscopy analysis, QA thin films were crystallized at a substrate temperature of 80 °C or higher. At the substate temperature of 180 °C, highly ordering β phase QA thin films could be deposited with the largest gain size of ca. 232 nm and the maximum mobility of 2.95 × 10–2 cm2 /V s can be obtained. Thus, the grain sizes and phase selecting growth of the QA thin films could be controlled by the substrate temperature.
期刊介绍:
Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.