基于有效栅极长度的t型栅极HEMT改进紧凑模型

IF 2.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Kaiyuan Zhao;Hao Lu;Xiaoyu Cheng;Meng Zhang;Luqiao Yin;Bingjun Li;Aiying Guo;Jingjing Liu;Jianhua Zhang;Kailin Ren
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引用次数: 0

摘要

高电子迁移率晶体管(ASM-HEMT)的高级SPICE模型是基于gan的高电子迁移率晶体管(hemt)的行业标准模型之一,目前尚缺乏器件内部物理性质分布的解析模型。特别是横向电场(${E}_{\text {X}}$)和载流子浓度(${n}_{\text {S}}$)的分布模型,它们可以与漏极电流(${I}_{\text {DS}}$)和栅极电荷(${Q}_{\text {G}}$)联系起来。此外,ASM-HEMT饱和区操作的建模依赖于经验参数,没有物理意义。在本工作中:1)计算有效栅极长度(${L}_{\text {G,eff}}$)作为饱和区域建模的核心参数,以捕获hemt中发生的速度饱和;2)模拟了线性区和饱和区${E}_{\text {X}}$和${n}_{\text {S}}$随栅极和漏极偏置变化的分布;3)建立了场极板(FP)感知的t栅极HEMT模型,以捕捉由FP引起的峰值电场减小和附加寄生效应。通过表征所制备的t栅hemt的${I}_{\text {DS}}$和Miller电容(${C}_{\text {GD}}$)对模型进行了验证,RMSE均小于7.5%,表明模型具有较高的一致性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An Improved Compact Model of T-Gate HEMT Based on Effective Gate Length
Advanced SPICE Model for high electron mobility transistor (ASM-HEMT) is one of the industry standard models for GaN-based high electron mobility transistors (HEMTs), in which there still lack analytical models for the distribution of the physical properties inside the device, especially a model for the distribution of the transverse electric field ( ${E}_{\text {X}}$ ) and carrier concentration ( ${n}_{\text {S}}$ ) that can be linked to the drain current ( ${I}_{\text {DS}}$ ) and gate charge ( ${Q}_{\text {G}}$ ). Besides, the modeling of operations in the saturation region in ASM-HEMT is dependent on empirical parameters without physical significance. In this work: 1) effective gate length ( ${L}_{\text {G,eff}}$ ) as a core parameter for saturation region modeling is calculated to capture the velocity saturation occurring in HEMTs; 2) distribution of ${E}_{\text {X}}$ and ${n}_{\text {S}}$ varying with gate and drain biases in the linear and saturation regions is modeled; 3) a field plate (FP) aware T-gate HEMT model is developed to capture the reduction of the peak electric field and the additional parasitic effect caused by the FP. The model is verified by characterizing the ${I}_{\text {DS}}$ and Miller capacitance ( ${C}_{\text {GD}}$ ) of the fabricated T-gate HEMTs, with RMSE lower than 7.5%, indicating a high degree of agreement.
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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