一种具有优异弯曲稳健性和超低静态电流的基于InSnO薄膜晶体管的柔性低压差稳压器

IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Tingrui Huang;Zuoxu Yu;Yuzhen Zhang;Di Gui;Mingming Liu;Kaizhi Sui;Wenting Xu;Guangan Yang;Wangran Wu;Weifeng Sun
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引用次数: 0

摘要

在这项工作中,首次展示了基于50- $\mu $ m聚酰亚胺(PI)衬底上的InSnO (ITO)薄膜晶体管(TFTs)的柔性低差调节器(LDO)。LDO是通过集成的耗尽模式和增强模式(d模式和e模式)ITO tft分别具有6纳米和4纳米厚的ITO通道层来实现的。采用4晶体管(4T)基准电压和误差放大器尾电流限制的低电流设计,实现了LDO的超低静态电流(I $_{\text {q}}\text {)}$低至10 nA)。在弯曲半径(r $_{\text {bent}}\text {)}$)为5 mm,阈值电压位移($\Delta $ V $_{\text {th}}\text {)}$)小于0.01 V的情况下,ITO TFTs在弯曲实验中表现出良好的电鲁棒性。LDO的输出电压和线路稳压在5mm的弯曲下变化不大。此外,在10000次弯曲循环后,ITO tft的电学性能保持不变。因此,LDO在低功耗电源管理单元(PMU)的灵活应用方面具有很大的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Flexible Low Dropout Regulator Based on InSnO Thin-Film Transistors With Superior Bending Robustness and Ultra-Low Quiescent Current
In this work, a flexible low dropout regulator (LDO) based on InSnO (ITO) thin film transistors (TFTs) on a 50- $\mu $ m polyimide (PI) substrate is demonstrated for the first time. The LDO is realized through integrated depleted- and enhanced-mode (D-mode and E-mode) ITO TFTs with 6-nm and 4-nm thick ITO channel layers respectively. Low-current design in 4-transistors (4T) voltage reference and restriction of tail current in error amplifier are adopted to achieve ultra-low quiescent current (I $_{\text {q}}\text {)}$ down to 10 nA for the LDO. The ITO TFTs show great electrical robustness in bending experiment under bent radii (r $_{\text {bent}}\text {)}$ of 5 mm with threshold voltage shift ( $\Delta $ V $_{\text {th}}\text {)}$ less than 0.01 V. Both the output voltage and line regulation of the LDO change little under rbent of 5 mm. Besides, after 10000 bending cycles, the electrical properties of ITO TFTs maintain unchanged. Therefore, the LDO exhibits great potential in flexible application of power management unit (PMU) with low power consumption.
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来源期刊
IEEE Electron Device Letters
IEEE Electron Device Letters 工程技术-工程:电子与电气
CiteScore
8.20
自引率
10.20%
发文量
551
审稿时长
1.4 months
期刊介绍: IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.
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