抑制负v移和增强抗假导通鲁棒性的裂p- gan栅极HEMT

IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Yunhong Lao;Jin Wei;Maojun Wang;Jingjing Yu;Zetao Fan;Junjie Yang;Jiawei Cui;Teng Li;Han Yang;Muqin Nuo;Qimeng Jiang;Gaofei Tang;Bo Shen
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In this work, a split-p-GaN gate HEMT (SPG-HEMT) is demonstrated to effectively suppress the drain-induced negative <inline-formula> <tex-math>${V}_{\\text {th}}$ </tex-math></inline-formula> shift, enhancing the robustness against false turn-on. At <inline-formula> <tex-math>${V}_{\\text {DS}} =100$ </tex-math></inline-formula> V, the conventional p-GaN gate HEMT (Conv-HEMT) suffers a negative <inline-formula> <tex-math>${V}_{\\text {th}}$ </tex-math></inline-formula> shift of −0.33 V, while the SPG-HEMT exhibits only a minimal <inline-formula> <tex-math>${V}_{\\text {th}}$ </tex-math></inline-formula> shift of −0.07 V. 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In contrast, the SPG-HEMT starts to show false turn-on signal only when the <inline-formula> <tex-math>${V}_{\\text {GS}}$ </tex-math></inline-formula> ringing peak is near <inline-formula> <tex-math>${V}_{{\\mathrm {th0}}}$ </tex-math></inline-formula>. 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引用次数: 0

摘要

在schottky型p-GaN栅极HEMT的开发中,${V}_{\text {th}}$的不稳定一直是一个突出的问题。在高${V}_{\text {DS}}$偏置下,浮动p-GaN的电势可以通过栅极/漏极耦合势垒降低(GDCBL)效应提高,引起明显的负${V}_{\text {th}}$移位。在快速开关操作中,负的${V}_{\text {th}}$移位严重加剧了误开问题。在这项工作中,分裂p- gan栅极HEMT (SPG-HEMT)被证明可以有效地抑制漏极诱导的负${V}_{\text {th}}$移位,增强对假导通的鲁棒性。在${V}_{\text {DS}} =100$ V时,传统p-GaN栅极HEMT (convo -HEMT)的${V}_{\text {th}}$位移为- 0.33 V,而SPG-HEMT的${V}_{\text {th}}$位移仅为- 0.07 V。在SPG-HEMT中,GDCBL效应只发生在靠近漏极侧的p- gan上(p $_{{2}}\text {)}$;源(p $_{{1}}\text{)}$附近的p- gan通过栅极/p- gan肖特基结与p2隔离,漏极偏置对p1的影响被p2屏蔽。然后,通过半桥开关电路评估负${V}_{\text {th}}$移位对误导通的影响。由于${V}_{\text {th}}$有明显的负位移,当${V}_{\text {GS}}$振铃峰值仍远低于静态阈值电压(${V}_{\ maththrm {th0}}})$时,con - hemt被误导通。而SPG-HEMT只有在${V}_{\text {GS}}$振铃峰接近${V}_{{\mathrm {th0}}}$时才开始出现假导通信号。总体而言,SPG-HEMT独特的器件结构导致可忽略的负${V}_{\text {th}}$移位,增强了对假导通的鲁棒性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Split-p-GaN Gate HEMT With Suppressed Negative Vth Shift and Enhanced Robustness Against False Turn-On
In the development of the Schottky-type p-GaN gate HEMT, the instable ${V}_{\text {th}}$ is always a highlighted problem. Under high ${V}_{\text {DS}}$ bias, the potential of the floating p-GaN can be raised by the gate/drain coupled barrier lowering (GDCBL) effect, inducing a noticeable negative ${V}_{\text {th}}$ shift. During the fast switching operation, the negative ${V}_{\text {th}}$ shift severely aggravates the false turn-on problem. In this work, a split-p-GaN gate HEMT (SPG-HEMT) is demonstrated to effectively suppress the drain-induced negative ${V}_{\text {th}}$ shift, enhancing the robustness against false turn-on. At ${V}_{\text {DS}} =100$ V, the conventional p-GaN gate HEMT (Conv-HEMT) suffers a negative ${V}_{\text {th}}$ shift of −0.33 V, while the SPG-HEMT exhibits only a minimal ${V}_{\text {th}}$ shift of −0.07 V. In the SPG-HEMT, the GDCBL effect takes place only for the p-GaN near the drain side (p $_{{2}}\text {)}$ ; the p-GaN near the source (p $_{{1}}\text {)}$ is isolated from p2 via the gate/p-GaN Schottky junctions, and the influence of drain bias upon p1 is shielded by p2. Then, the impact of negative ${V}_{\text {th}}$ shift on false turn-on is evaluated by a half-bridge switching circuit. Due to the obvious negative ${V}_{\text {th}}$ shift, the Conv-HEMT is falsely turned on when the ${V}_{\text {GS}}$ ringing peak is still much lower than the static threshold voltage ( ${V}_{{\mathrm {th0}}})$ . In contrast, the SPG-HEMT starts to show false turn-on signal only when the ${V}_{\text {GS}}$ ringing peak is near ${V}_{{\mathrm {th0}}}$ . Overall, the unique device structure of the SPG-HEMT leads to a negligible negative ${V}_{\text {th}}$ shift and enhances the robustness against false turn-on.
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来源期刊
IEEE Electron Device Letters
IEEE Electron Device Letters 工程技术-工程:电子与电气
CiteScore
8.20
自引率
10.20%
发文量
551
审稿时长
1.4 months
期刊介绍: IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.
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