研究了拓扑p-TlBiSe2/n-ITO异质结增强的宽带光谱光探测(UV-NIR)和高探测率

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Gyanendra Kumar Maurya , Sandeep Kumar Verma , Roshani Singh , Satendra Kumar , Vipin Kumar , Rachana Kumar , Pramod Kumar
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引用次数: 0

摘要

TlBiSe2等拓扑绝缘体材料组成的异质结由于其多样而独特的特性和功能引起了广泛的研究关注。拓扑异质结的出现可以导致界面处的p-n结具有强大的关键势垒,增强了拓扑绝缘体的光探测能力。本研究启发了基于拓扑绝缘体p-TlBiSe2/n-ITO的新型异质结光电探测器的成功制作和表征,在从紫外(UV)到近红外(NIR)的宽光谱范围内表现出卓越的光电探测能力。TlBiSe2独特的拓扑性质,结合ITO优异的导电性,有助于提高响应性和探测性。详细分析表明,该异质结具有较高的光探测性能,具有较强的光谱响应率、外量子效率和快速的响应时间,探测波长范围为200 nm至1000 nm,高响应率1357 A/W和令人印象深刻的2.89×1012 Jones探测值使得该异质结非常适合需要广谱探测的应用。这些发现突出了p-TlBiSe2/n-ITO异质结在UV和NIR应用中的下一代光电探测器的潜力,为未来的光电器件提供了一个有前途的平台。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Enhanced wide band spectral photodetection (UV-NIR) and high detectivity investigated in topological p-TlBiSe2/n-ITO heterojunction

Enhanced wide band spectral photodetection (UV-NIR) and high detectivity investigated in topological p-TlBiSe2/n-ITO heterojunction
Heterojunctions comprised of topological insulator material such as TlBiSe2 have sparked intense study attention due to their diverse and unique characteristics and functionalities. The emergence of topological heterojunction can result in a p-n junction at the interfaces having a strong crucial potential barrier that enhances the photodetection capabilities of topological insulators. This study enlightens the successful fabrication and characterization of a novel heterojunction photodetector based on topological insulator p-TlBiSe2/n-ITO, demonstrated remarkable photodetection abilities across a wide spectral range from ultraviolet (UV) to near-infrared (NIR). The unique topological properties of TlBiSe2, combined with the excellent conductivity of ITO, contribute to enhanced responsivity and detectivity. Detailed analysis revealed high photodetection performance, with strong spectral responsivity, external quantum efficiency, and fast response time in detecting wavelengths ranging from 200 nm to 1000 nm, The high value of responsivity 1357 A/W and impressive detectivity value of 2.89×1012 Jones makes this heterojunction highly suitable for applications requiring broad-spectrum detection. These findings highlight the potential of p-TlBiSe2/n-ITO heterojunctions for next-generation photodetectors in UV and NIR applications, offering a promising platform for future optoelectronic devices.
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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