用椭偏法和反射率法对镁薄膜的光学性质进行了建模

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Á.Bueno García , P. Prieto , I.J. Ferrer , F. Leardini , G. Tabares , J.R. Ares , N. Gordillo
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引用次数: 0

摘要

关于镁基薄膜的光学常数,如复折射率,文献报道很少。因此,本工作提出了两个自一致的椭圆偏振模型,能够确定250 ~ 1600 nm波长范围内不同厚度的电子束蒸发Mg薄膜的光学常数。通过拟合三种不同入射角的椭偏光谱测量和反射率测量,验证了这些模型。最薄薄膜的光学常数表示由于在场发射枪扫描电子显微镜图像中观察到的空洞影响的吸收损失。当在椭偏模型中考虑这些空洞时,观察到在800 nm波长处消光系数(k)从4.4降低到3.6。较厚的薄膜呈现不同的形态,导致光学响应的剧烈变化,导致反射率和k降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modelling the optical properties of magnesium thin films determined by ellipsometry and reflectometry
The optical constants of magnesium (Mg) based films, such as the complex refractive index, are poorly reported in the literature. Consequently, this work presents two self-consistent ellipsometry models capable of determining the optical constants of electron beam evaporated Mg thin films of different thicknesses within a wavelength range from 250 to 1600 nm. These models were validated by fitting spectroscopic ellipsometry measurements at three different incident angles and reflectance measurements. The optical constants of the thinnest film indicate absorption losses due to the influence of voids observed in Field Emission Gun-Scanning Electron Microscopy images. When these voids are considered in the ellipsometry model, a reduction in the extinction coefficient (k) from 4.4 to 3.6 at a wavelength of 800 nm is observed. Thicker films present a different morphology resulting in a drastic change in the optical response leading to reflectivity and k reduction.
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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