Yun-Chan Kim , Dong-Yurl Yu , Shin-Il Kim , Yong-Mo Kim , Dongjin Byun , Junghwan Bang , Dongjin Kim
{"title":"SiC功率器件用AMB衬底的耐热耐久性:AlN和Si3N4,哪个耐热强?","authors":"Yun-Chan Kim , Dong-Yurl Yu , Shin-Il Kim , Yong-Mo Kim , Dongjin Byun , Junghwan Bang , Dongjin Kim","doi":"10.1016/j.microrel.2025.115676","DOIUrl":null,"url":null,"abstract":"<div><div>In terms of long-term reliability, the present study investigated the heat-resistant durability of both AlN- and Si<sub>3</sub>N<sub>4</sub> cored active metal brazing (AMB) substrates to demonstrate which material can be a better option for use in silicon carbide (SiC) power applications. Interfacial degradation behaviors, peeling strengths, and fracture modes of the AlN- and Si<sub>3</sub>N<sub>4</sub>-AMB substrates were carried out before and after thermal shock cycling tests. The interfacial microstructure analysis of the AlN- and Si₃N₄-AMB substrates observed different brazing filler metal (BFM) reaction layers depending on the type of ceramic. As a result, it was noteworthy that AlN and Si<sub>3</sub>N<sub>4</sub>-AMB substrates subjected to repeated thermal shock cycles with Δ190 °C for up to 1000 cycles represented different failure modes with different strength in the peel strength test, respectively. Namely, these two kinds of ceramic type AMB substrates have fundamental differences in thermal shock durability. Nevertheless, cracks between the AMB and ceramic layers were equally caused on the edge side of the AlN and Si<sub>3</sub>N<sub>4</sub> cases after the thermal shock test. These cracks are the underlying principles that explain the load-extension plots in the peel strength test. This study systematically discussed the heat-resistant reliability of AMB substrates with AlN and Si<sub>3</sub>N<sub>4</sub> as key materials for application to next-generation SiC power devices.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"167 ","pages":"Article 115676"},"PeriodicalIF":1.6000,"publicationDate":"2025-03-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Heat-resistant durability of AMB substrates for SiC power devices: AlN and Si3N4, which one is thermally strong?\",\"authors\":\"Yun-Chan Kim , Dong-Yurl Yu , Shin-Il Kim , Yong-Mo Kim , Dongjin Byun , Junghwan Bang , Dongjin Kim\",\"doi\":\"10.1016/j.microrel.2025.115676\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>In terms of long-term reliability, the present study investigated the heat-resistant durability of both AlN- and Si<sub>3</sub>N<sub>4</sub> cored active metal brazing (AMB) substrates to demonstrate which material can be a better option for use in silicon carbide (SiC) power applications. Interfacial degradation behaviors, peeling strengths, and fracture modes of the AlN- and Si<sub>3</sub>N<sub>4</sub>-AMB substrates were carried out before and after thermal shock cycling tests. The interfacial microstructure analysis of the AlN- and Si₃N₄-AMB substrates observed different brazing filler metal (BFM) reaction layers depending on the type of ceramic. As a result, it was noteworthy that AlN and Si<sub>3</sub>N<sub>4</sub>-AMB substrates subjected to repeated thermal shock cycles with Δ190 °C for up to 1000 cycles represented different failure modes with different strength in the peel strength test, respectively. Namely, these two kinds of ceramic type AMB substrates have fundamental differences in thermal shock durability. Nevertheless, cracks between the AMB and ceramic layers were equally caused on the edge side of the AlN and Si<sub>3</sub>N<sub>4</sub> cases after the thermal shock test. These cracks are the underlying principles that explain the load-extension plots in the peel strength test. This study systematically discussed the heat-resistant reliability of AMB substrates with AlN and Si<sub>3</sub>N<sub>4</sub> as key materials for application to next-generation SiC power devices.</div></div>\",\"PeriodicalId\":51131,\"journal\":{\"name\":\"Microelectronics Reliability\",\"volume\":\"167 \",\"pages\":\"Article 115676\"},\"PeriodicalIF\":1.6000,\"publicationDate\":\"2025-03-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Microelectronics Reliability\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0026271425000897\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microelectronics Reliability","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0026271425000897","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Heat-resistant durability of AMB substrates for SiC power devices: AlN and Si3N4, which one is thermally strong?
In terms of long-term reliability, the present study investigated the heat-resistant durability of both AlN- and Si3N4 cored active metal brazing (AMB) substrates to demonstrate which material can be a better option for use in silicon carbide (SiC) power applications. Interfacial degradation behaviors, peeling strengths, and fracture modes of the AlN- and Si3N4-AMB substrates were carried out before and after thermal shock cycling tests. The interfacial microstructure analysis of the AlN- and Si₃N₄-AMB substrates observed different brazing filler metal (BFM) reaction layers depending on the type of ceramic. As a result, it was noteworthy that AlN and Si3N4-AMB substrates subjected to repeated thermal shock cycles with Δ190 °C for up to 1000 cycles represented different failure modes with different strength in the peel strength test, respectively. Namely, these two kinds of ceramic type AMB substrates have fundamental differences in thermal shock durability. Nevertheless, cracks between the AMB and ceramic layers were equally caused on the edge side of the AlN and Si3N4 cases after the thermal shock test. These cracks are the underlying principles that explain the load-extension plots in the peel strength test. This study systematically discussed the heat-resistant reliability of AMB substrates with AlN and Si3N4 as key materials for application to next-generation SiC power devices.
期刊介绍:
Microelectronics Reliability, is dedicated to disseminating the latest research results and related information on the reliability of microelectronic devices, circuits and systems, from materials, process and manufacturing, to design, testing and operation. The coverage of the journal includes the following topics: measurement, understanding and analysis; evaluation and prediction; modelling and simulation; methodologies and mitigation. Papers which combine reliability with other important areas of microelectronics engineering, such as design, fabrication, integration, testing, and field operation will also be welcome, and practical papers reporting case studies in the field and specific application domains are particularly encouraged.
Most accepted papers will be published as Research Papers, describing significant advances and completed work. Papers reviewing important developing topics of general interest may be accepted for publication as Review Papers. Urgent communications of a more preliminary nature and short reports on completed practical work of current interest may be considered for publication as Research Notes. All contributions are subject to peer review by leading experts in the field.