微波诱导等离子体增强发射光谱的表征与优化

IF 2.5 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
H. Sadeghi, S. M. Sadat Kiai, Samaneh Fazelpour, S. P. Shirmardi, Shahriar Fathi
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引用次数: 0

摘要

在这项研究中,我们提出了一种新的脉冲微波诱导等离子体(MIP)源,耦合了用于光学发射光谱(MIP- oes)的辉光放电,工作功率为1000 W,频率为2.45 GHz。MIP腔由一个不锈钢圆柱波导和一个由相同材料制成的圆形谐振器组成,通过一个介电石英盘连接。MIP腔的输出连接到一个封闭的辉光放电石英管和一个机械泵。通过数值模拟对MIP空腔的结构和尺寸进行了优化。通过精确调整圆柱谐振器输出的喷嘴位置,使其与最大磁场对齐,实现了TM011模式,产生了高密度的点等离子体。这种结构使腔体能够在发射源周围产生具有一致发射速率的致密、温暖的等离子体发射区。结果表明,与具有相似微波参数的其他源相比,所设计的MIP源具有更高的密度和温度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Characterization and Optimization of Microwave-Induced Plasma for Enhanced Optical Emission Spectrometry

Characterization and Optimization of Microwave-Induced Plasma for Enhanced Optical Emission Spectrometry

In this study, we present a novel pulsed microwave-induced plasma (MIP) source coupled with a glow discharge for optical emission spectrometry (MIP-OES), operating at 1000 W power and a frequency of 2.45 GHz. The MIP cavity consists of a stainless steel cylindrical waveguide connected to a circular resonator made of the same material, joined through a dielectric quartz disc. The output of the MIP cavity is linked to a closed glow discharge quartz tube and a mechanical pump. Numerical simulations were employed to optimize the structure and dimensions of the MIP cavity. The nozzle position of the cylindrical resonator's output was precisely adjusted to align with the maximum magnetic field, achieving the TM011 mode, which results in a point plasma with high density. This configuration enables the cavity to produce a dense, warm plasma emission zone with a consistent emission rate around the circumference of the emitting source. The results demonstrate that the designed MIP source exhibits a significantly higher density and temperature compared to other sources with similar microwave parameters.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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