Zhi-Yuan Wu;Ze Wang;Jing-Zhou Liu;Shao-Long Zhong;Jian-Tao Wang;Lei Huang;Zhi-Min Dang;Wei Wang
{"title":"金属化层与金属化膜自愈形态的结构-功能关系研究","authors":"Zhi-Yuan Wu;Ze Wang;Jing-Zhou Liu;Shao-Long Zhong;Jian-Tao Wang;Lei Huang;Zhi-Min Dang;Wei Wang","doi":"10.1109/TPS.2024.3505156","DOIUrl":null,"url":null,"abstract":"Metallized polypropylene film capacitors (MPPFCs) are widely used in electronic devices for their unique merits: self-healing. This work aims to explore the correlation mechanism between metallized layer structural parameters and self-healing properties in metallized polypropylene film (MPPF). The thicker electrode layer has a more irregular self-healing morphology and needs more energy to restore insulation at the same self-healing area compared to the thinner electrode layer, and the thicker electrode layer has a greater adhesive force, and the root mean square (rms) at <inline-formula> <tex-math>$5~\\Omega / \\square$ </tex-math></inline-formula> thickness is 2.67 times larger than that at 50-<inline-formula> <tex-math>$\\Omega / \\square$ </tex-math></inline-formula> electrode layer thickness. Different surface morphologies of MPPF and different potential differences are the reasons for different self-healing morphologies, which play an important role in self-healing properties, the potential difference at 5-<inline-formula> <tex-math>$\\Omega / \\square$ </tex-math></inline-formula> electrode thickness is 149.2 mV, 1.92 times larger than that at 50-<inline-formula> <tex-math>$\\Omega / \\square$ </tex-math></inline-formula> electrode thickness. The simulation model shows the different stages of plasma development in self-healing, and the plasma develops fast and then slows down in the final stage. The maximum electron temperature in self-healing plasma can reach over 4000 K. The model also explains the influence mechanism of adhesion force on the self-healing plasma and the structure change of the dielectric layer during the plasma process, the carbonized depth in 500 W/m2, thermal flux is <inline-formula> <tex-math>$0.19~\\mu $ </tex-math></inline-formula>m, but in 1 W/m2, and the carbonized depth is <inline-formula> <tex-math>$0.65~\\mu $ </tex-math></inline-formula>m, which is a threefold increase.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 11","pages":"5366-5375"},"PeriodicalIF":1.3000,"publicationDate":"2024-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Study on the Structure–Function Relationship Between Metallized Layer and Self-Healing Morphology in Metallized Film\",\"authors\":\"Zhi-Yuan Wu;Ze Wang;Jing-Zhou Liu;Shao-Long Zhong;Jian-Tao Wang;Lei Huang;Zhi-Min Dang;Wei Wang\",\"doi\":\"10.1109/TPS.2024.3505156\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Metallized polypropylene film capacitors (MPPFCs) are widely used in electronic devices for their unique merits: self-healing. This work aims to explore the correlation mechanism between metallized layer structural parameters and self-healing properties in metallized polypropylene film (MPPF). The thicker electrode layer has a more irregular self-healing morphology and needs more energy to restore insulation at the same self-healing area compared to the thinner electrode layer, and the thicker electrode layer has a greater adhesive force, and the root mean square (rms) at <inline-formula> <tex-math>$5~\\\\Omega / \\\\square$ </tex-math></inline-formula> thickness is 2.67 times larger than that at 50-<inline-formula> <tex-math>$\\\\Omega / \\\\square$ </tex-math></inline-formula> electrode layer thickness. Different surface morphologies of MPPF and different potential differences are the reasons for different self-healing morphologies, which play an important role in self-healing properties, the potential difference at 5-<inline-formula> <tex-math>$\\\\Omega / \\\\square$ </tex-math></inline-formula> electrode thickness is 149.2 mV, 1.92 times larger than that at 50-<inline-formula> <tex-math>$\\\\Omega / \\\\square$ </tex-math></inline-formula> electrode thickness. The simulation model shows the different stages of plasma development in self-healing, and the plasma develops fast and then slows down in the final stage. The maximum electron temperature in self-healing plasma can reach over 4000 K. The model also explains the influence mechanism of adhesion force on the self-healing plasma and the structure change of the dielectric layer during the plasma process, the carbonized depth in 500 W/m2, thermal flux is <inline-formula> <tex-math>$0.19~\\\\mu $ </tex-math></inline-formula>m, but in 1 W/m2, and the carbonized depth is <inline-formula> <tex-math>$0.65~\\\\mu $ </tex-math></inline-formula>m, which is a threefold increase.\",\"PeriodicalId\":450,\"journal\":{\"name\":\"IEEE Transactions on Plasma Science\",\"volume\":\"52 11\",\"pages\":\"5366-5375\"},\"PeriodicalIF\":1.3000,\"publicationDate\":\"2024-12-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Plasma Science\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10778093/\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"PHYSICS, FLUIDS & PLASMAS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10778093/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
Study on the Structure–Function Relationship Between Metallized Layer and Self-Healing Morphology in Metallized Film
Metallized polypropylene film capacitors (MPPFCs) are widely used in electronic devices for their unique merits: self-healing. This work aims to explore the correlation mechanism between metallized layer structural parameters and self-healing properties in metallized polypropylene film (MPPF). The thicker electrode layer has a more irregular self-healing morphology and needs more energy to restore insulation at the same self-healing area compared to the thinner electrode layer, and the thicker electrode layer has a greater adhesive force, and the root mean square (rms) at $5~\Omega / \square$ thickness is 2.67 times larger than that at 50-$\Omega / \square$ electrode layer thickness. Different surface morphologies of MPPF and different potential differences are the reasons for different self-healing morphologies, which play an important role in self-healing properties, the potential difference at 5-$\Omega / \square$ electrode thickness is 149.2 mV, 1.92 times larger than that at 50-$\Omega / \square$ electrode thickness. The simulation model shows the different stages of plasma development in self-healing, and the plasma develops fast and then slows down in the final stage. The maximum electron temperature in self-healing plasma can reach over 4000 K. The model also explains the influence mechanism of adhesion force on the self-healing plasma and the structure change of the dielectric layer during the plasma process, the carbonized depth in 500 W/m2, thermal flux is $0.19~\mu $ m, but in 1 W/m2, and the carbonized depth is $0.65~\mu $ m, which is a threefold increase.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.