二维微带v波段弯曲线慢波结构的激光微加工

IF 2.9 2区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

IEEE Transactions on Electron Devices Pub Date : 2024-12-05 DOI:10.1109/TED.2024.3507759

Dmitrii A. Nozhkin;Andrei V. Starodubov;Roman A. Torgashov;Viktor V. Galushka;Ilya O. Kozhevnikov;Alexey A. Serdobintsev;Alexey D. Lebedev;Anton A. Kozyrev;Nikita M. Ryskin

{"title":"二维微带v波段弯曲线慢波结构的激光微加工","authors":"Dmitrii A. Nozhkin;Andrei V. Starodubov;Roman A. Torgashov;Viktor V. Galushka;Ilya O. Kozhevnikov;Alexey A. Serdobintsev;Alexey D. Lebedev;Anton A. Kozyrev;Nikita M. Ryskin","doi":"10.1109/TED.2024.3507759","DOIUrl":null,"url":null,"abstract":"Vacuum electron devices operating at sub-THz frequencies require miniaturized high-frequency electromagnetic interaction structures manufactured using high-precision micromachining technologies. In this article, we present the results of microfabrication of 2-D planar microstrip periodic slow wave structures (SWSs) on dielectric substrate using magnetron sputtering and laser micromachining. A multistage optimized process that allows a substantial improvement of the fabrication accuracy is presented and discussed in detail. A batch of V-band meander-line SWS circuits is fabricated. Characterization of the fabricated structures by optical microscopy and scanning electron microscopy (SEM) demonstrates dimensional deviation less than \n<inline-formula> <tex-math>$5~\\mu $ </tex-math></inline-formula>\nm. Experimental investigation of cold-test electromagnetic parameters shows good transmission and reflection characteristics.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 1","pages":"453-458"},"PeriodicalIF":2.9000,"publicationDate":"2024-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Laser Micromachining of 2-D Microstrip V-Band Meander-Line Slow Wave Structures\",\"authors\":\"Dmitrii A. Nozhkin;Andrei V. Starodubov;Roman A. Torgashov;Viktor V. Galushka;Ilya O. Kozhevnikov;Alexey A. Serdobintsev;Alexey D. Lebedev;Anton A. Kozyrev;Nikita M. Ryskin\",\"doi\":\"10.1109/TED.2024.3507759\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Vacuum electron devices operating at sub-THz frequencies require miniaturized high-frequency electromagnetic interaction structures manufactured using high-precision micromachining technologies. In this article, we present the results of microfabrication of 2-D planar microstrip periodic slow wave structures (SWSs) on dielectric substrate using magnetron sputtering and laser micromachining. A multistage optimized process that allows a substantial improvement of the fabrication accuracy is presented and discussed in detail. A batch of V-band meander-line SWS circuits is fabricated. Characterization of the fabricated structures by optical microscopy and scanning electron microscopy (SEM) demonstrates dimensional deviation less than \\n<inline-formula> <tex-math>$5~\\\\mu $ </tex-math></inline-formula>\\nm. Experimental investigation of cold-test electromagnetic parameters shows good transmission and reflection characteristics.\",\"PeriodicalId\":13092,\"journal\":{\"name\":\"IEEE Transactions on Electron Devices\",\"volume\":\"72 1\",\"pages\":\"453-458\"},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2024-12-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Electron Devices\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10778585/\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10778585/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

引用次数: 0

摘要

在次太赫兹频率下工作的真空电子器件需要使用高精度微加工技术制造的小型化高频电磁相互作用结构。本文介绍了利用磁控溅射和激光微加工技术在介质衬底上微加工二维平面微带周期性慢波结构的研究结果。提出并详细讨论了一种可大幅度提高加工精度的多阶段优化工艺。制作了一批v波段弯曲线SWS电路。通过光学显微镜和扫描电子显微镜（SEM）对制备的结构进行了表征，尺寸偏差小于$5~\mu $ m，冷试电磁参数的实验研究显示出良好的透射和反射特性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Laser Micromachining of 2-D Microstrip V-Band Meander-Line Slow Wave Structures

Vacuum electron devices operating at sub-THz frequencies require miniaturized high-frequency electromagnetic interaction structures manufactured using high-precision micromachining technologies. In this article, we present the results of microfabrication of 2-D planar microstrip periodic slow wave structures (SWSs) on dielectric substrate using magnetron sputtering and laser micromachining. A multistage optimized process that allows a substantial improvement of the fabrication accuracy is presented and discussed in detail. A batch of V-band meander-line SWS circuits is fabricated. Characterization of the fabricated structures by optical microscopy and scanning electron microscopy (SEM) demonstrates dimensional deviation less than

$5~\mu $

m. Experimental investigation of cold-test electromagnetic parameters shows good transmission and reflection characteristics.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

IEEE Transactions on Electron Devices 工程技术-工程：电子与电气

CiteScore

5.80

自引率

16.10%

发文量

937

审稿时长

3.8 months

期刊介绍： IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.