脊载扩展相互作用腔增强扩展相互作用速调管的带宽

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2024-12-03 DOI:10.1109/TPS.2024.3499351

Vemula Bhanu Naidu;Dipanjan Gope;Subrata Kumar Datta

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引用次数: 0

摘要

本文提出了扩展相互作用腔的上下短腔的对称脊加载方案，用于扩展相互作用速调管（EIK）的宽带化。在实施该方案时，没有改变阶梯电路的周期性。为了验证山脊载荷在宽带中的有效性，对w波段扩展相互作用空腔结构进行了三维电磁分析。研究发现，在95 GHz频率下，与无负载相比，脊载可使扩展相互作用腔的欧姆质量因子降低25%。同时，脊荷载对结构的特性阻抗和峰值轴向电场的影响也呈现出微小的变化。细胞内粒子（PIC）分析表明，与未加载设备（185 MHz）相比，脊加载EIK （464 MHz）的3db热带宽提高了约250%。

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Bandwidth Enhancement of Extended Interaction Klystron by Ridge-Loaded Extended Interaction Cavity

A scheme of symmetric ridge loading of the top and bottom shorting cavities of an extended interaction cavity is proposed in this article for the broadbanding of an extended interaction klystron (EIK). While implementing this scheme, the periodicity of the ladder circuit has not been changed. In order to demonstrate the efficacy of the ridge loading in broadbanding, 3-D electromagnetic analysis was carried out on a W-band extended interaction cavity structure. The ridge loading is found to reduce the ohmic quality factor of the extended interaction cavity by 25% against that of no loading for the cavity operating at 95 GHz. At the same time, the ridge loading has shown marginal changes on the characteristic impedance and the peak axial electric field of the structure. A particle-in-cell (PIC) analysis has shown an enhancement in the 3-dB hot bandwidth of the ridge-loaded EIK (464 MHz) by around 250% in comparison to an unloaded device (185 MHz).

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.