Ying Cheng;Weihao Liu;Zhengyu Huang;Shaobin Liu;Shangchen Fu
{"title":"双指数电压脉冲驱动的x波段相对论后向波振荡器研究","authors":"Ying Cheng;Weihao Liu;Zhengyu Huang;Shaobin Liu;Shangchen Fu","doi":"10.1109/TPS.2024.3496908","DOIUrl":null,"url":null,"abstract":"Diminishing the dimensions and weight of high-power microwave (HPM) sources at the gigawatt level holds paramount significance in numerous pragmatic applications. Existing HPM sources typically necessitate a precisely rectangular driving pulse, mandating intricate pulse-forming apparatus for the driving source. In this context, our proposal aims to streamline the driving source and alleviate its weight by advocating the utilization of a readily available dual-exponential voltage pulse to drive an X-band relativistic backward-wave oscillator (RBWO). Through detailed particle-in-cell (PIC) simulations, we examine the operational efficiencies of an RBWO driven by dual-exponential voltage pulses. We delve into the spectral properties, power level, and temporal profiles (including rising time, saturation time, and pulse duration) of the resultant HPM generation driven by a dual-exponential voltage pulse, all meticulously delineated and comparable to conventional rectangular-pulse driving scenarios. Our findings underscore the potential of dual-exponential voltage pulses in driving HPM sources, highlighting their compactness and cost-effectiveness as significant advantages.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 10","pages":"5145-5150"},"PeriodicalIF":1.5000,"publicationDate":"2024-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Investigation on an X-Band Relativistic Backward Wave Oscillator Driven by a Dual-Exponential Voltage Pulse\",\"authors\":\"Ying Cheng;Weihao Liu;Zhengyu Huang;Shaobin Liu;Shangchen Fu\",\"doi\":\"10.1109/TPS.2024.3496908\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Diminishing the dimensions and weight of high-power microwave (HPM) sources at the gigawatt level holds paramount significance in numerous pragmatic applications. Existing HPM sources typically necessitate a precisely rectangular driving pulse, mandating intricate pulse-forming apparatus for the driving source. In this context, our proposal aims to streamline the driving source and alleviate its weight by advocating the utilization of a readily available dual-exponential voltage pulse to drive an X-band relativistic backward-wave oscillator (RBWO). Through detailed particle-in-cell (PIC) simulations, we examine the operational efficiencies of an RBWO driven by dual-exponential voltage pulses. We delve into the spectral properties, power level, and temporal profiles (including rising time, saturation time, and pulse duration) of the resultant HPM generation driven by a dual-exponential voltage pulse, all meticulously delineated and comparable to conventional rectangular-pulse driving scenarios. Our findings underscore the potential of dual-exponential voltage pulses in driving HPM sources, highlighting their compactness and cost-effectiveness as significant advantages.\",\"PeriodicalId\":450,\"journal\":{\"name\":\"IEEE Transactions on Plasma Science\",\"volume\":\"52 10\",\"pages\":\"5145-5150\"},\"PeriodicalIF\":1.5000,\"publicationDate\":\"2024-11-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Plasma Science\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10758376/\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"PHYSICS, FLUIDS & PLASMAS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10758376/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
Investigation on an X-Band Relativistic Backward Wave Oscillator Driven by a Dual-Exponential Voltage Pulse
Diminishing the dimensions and weight of high-power microwave (HPM) sources at the gigawatt level holds paramount significance in numerous pragmatic applications. Existing HPM sources typically necessitate a precisely rectangular driving pulse, mandating intricate pulse-forming apparatus for the driving source. In this context, our proposal aims to streamline the driving source and alleviate its weight by advocating the utilization of a readily available dual-exponential voltage pulse to drive an X-band relativistic backward-wave oscillator (RBWO). Through detailed particle-in-cell (PIC) simulations, we examine the operational efficiencies of an RBWO driven by dual-exponential voltage pulses. We delve into the spectral properties, power level, and temporal profiles (including rising time, saturation time, and pulse duration) of the resultant HPM generation driven by a dual-exponential voltage pulse, all meticulously delineated and comparable to conventional rectangular-pulse driving scenarios. Our findings underscore the potential of dual-exponential voltage pulses in driving HPM sources, highlighting their compactness and cost-effectiveness as significant advantages.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.