Chih-Cherng Liao;Ching-Ho Li;Karuna Nidhi;Chieh-Yao Chuang;Hsien-Feng Liao;Yeh-Ning Jou;Ke-Horng Chen;Jian-Hsing Lee
{"title":"ESD对电源冲击时内部电路的失效机理","authors":"Chih-Cherng Liao;Ching-Ho Li;Karuna Nidhi;Chieh-Yao Chuang;Hsien-Feng Liao;Yeh-Ning Jou;Ke-Horng Chen;Jian-Hsing Lee","doi":"10.1109/TDMR.2024.3467116","DOIUrl":null,"url":null,"abstract":"Although power supply stressed with respect to another supply is one test items of the electrostatic-discharge (ESD) qualification. However, a current path still exists that has not been reported earlier. From the failure analysis result, the damage is located at the high-voltage N-Well (HVNW) guard-ring of the zapped power domain. Based on the TCAD simulation, the failure mechanism is identified, and shows good agreement with silicon. It proves that the ESD current can only flow through the internal circuit of the zapped power domain and P+ guard-ring (VSS) to become a quiescent current before the power clamp device turns on. So, the internal circuit of the zapped power domain and P+ guard-ring become a substrate triggering circuit to turn on the parasitic npn bipolar between two different power domains, resulting in most ESD current flowing through HVNW guard-rings to induce the damage.","PeriodicalId":448,"journal":{"name":"IEEE Transactions on Device and Materials Reliability","volume":"24 4","pages":"472-479"},"PeriodicalIF":2.5000,"publicationDate":"2024-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The Failure Mechanism of Internal Circuit During ESD Striking a Power to Another Power\",\"authors\":\"Chih-Cherng Liao;Ching-Ho Li;Karuna Nidhi;Chieh-Yao Chuang;Hsien-Feng Liao;Yeh-Ning Jou;Ke-Horng Chen;Jian-Hsing Lee\",\"doi\":\"10.1109/TDMR.2024.3467116\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Although power supply stressed with respect to another supply is one test items of the electrostatic-discharge (ESD) qualification. However, a current path still exists that has not been reported earlier. From the failure analysis result, the damage is located at the high-voltage N-Well (HVNW) guard-ring of the zapped power domain. Based on the TCAD simulation, the failure mechanism is identified, and shows good agreement with silicon. It proves that the ESD current can only flow through the internal circuit of the zapped power domain and P+ guard-ring (VSS) to become a quiescent current before the power clamp device turns on. So, the internal circuit of the zapped power domain and P+ guard-ring become a substrate triggering circuit to turn on the parasitic npn bipolar between two different power domains, resulting in most ESD current flowing through HVNW guard-rings to induce the damage.\",\"PeriodicalId\":448,\"journal\":{\"name\":\"IEEE Transactions on Device and Materials Reliability\",\"volume\":\"24 4\",\"pages\":\"472-479\"},\"PeriodicalIF\":2.5000,\"publicationDate\":\"2024-09-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Device and Materials Reliability\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10690179/\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Device and Materials Reliability","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10690179/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
The Failure Mechanism of Internal Circuit During ESD Striking a Power to Another Power
Although power supply stressed with respect to another supply is one test items of the electrostatic-discharge (ESD) qualification. However, a current path still exists that has not been reported earlier. From the failure analysis result, the damage is located at the high-voltage N-Well (HVNW) guard-ring of the zapped power domain. Based on the TCAD simulation, the failure mechanism is identified, and shows good agreement with silicon. It proves that the ESD current can only flow through the internal circuit of the zapped power domain and P+ guard-ring (VSS) to become a quiescent current before the power clamp device turns on. So, the internal circuit of the zapped power domain and P+ guard-ring become a substrate triggering circuit to turn on the parasitic npn bipolar between two different power domains, resulting in most ESD current flowing through HVNW guard-rings to induce the damage.
期刊介绍:
The scope of the publication includes, but is not limited to Reliability of: Devices, Materials, Processes, Interfaces, Integrated Microsystems (including MEMS & Sensors), Transistors, Technology (CMOS, BiCMOS, etc.), Integrated Circuits (IC, SSI, MSI, LSI, ULSI, ELSI, etc.), Thin Film Transistor Applications. The measurement and understanding of the reliability of such entities at each phase, from the concept stage through research and development and into manufacturing scale-up, provides the overall database on the reliability of the devices, materials, processes, package and other necessities for the successful introduction of a product to market. This reliability database is the foundation for a quality product, which meets customer expectation. A product so developed has high reliability. High quality will be achieved because product weaknesses will have been found (root cause analysis) and designed out of the final product. This process of ever increasing reliability and quality will result in a superior product. In the end, reliability and quality are not one thing; but in a sense everything, which can be or has to be done to guarantee that the product successfully performs in the field under customer conditions. Our goal is to capture these advances. An additional objective is to focus cross fertilized communication in the state of the art of reliability of electronic materials and devices and provide fundamental understanding of basic phenomena that affect reliability. In addition, the publication is a forum for interdisciplinary studies on reliability. An overall goal is to provide leading edge/state of the art information, which is critically relevant to the creation of reliable products.