大功率微波辐照下氩等离子体柱阵列的瞬态吸收特性分析

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Zhengming Tang;Yusen Yang;Lin Wang
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引用次数: 0

摘要

本文主要研究了微波等离子体的吸收特性。基于等离子体流体方法,提出了等离子体柱阵列结构来研究高功率微波脉冲的传输。研究了等离子体柱阵列在不同等离子体柱间隙宽度、不同等离子体柱半径长度和双层等离子体柱阵列结合吸波材料结构下对HPM的阻尼效应。确定了等离子体对高功率微波屏蔽效应的物理过程和机理。结果表明,等离子体柱阵列之间较大的间隙削弱了等离子体柱阵列对电磁波的吸收和反射。增大等离子体柱半径可以改善电磁波的吸收和反射,实现限制功能。此外,结合吸波材料的双层等离子体柱阵列结构可以防止电磁波的损失,达到最佳的电磁波吸收效果。本研究可为微波防护的应用提供更有效的指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transient Analysis of Absorption Characteristics of Argon Plasma Column Array Under High-Power Microwave Irradiation
This article mainly focuses on the absorption properties of microwave plasma. Based on the plasma fluid method, plasma column array structures are proposed to study the transmission of high-power microwave (HPM) pulses. The damping effect of the plasma column array on HPM with different plasma column gap widths, different plasma column radius lengths and a double-layer plasma column array in combination with an absorbing material structure is investigated. The physical process and mechanism of plasma shielding effect on high-power microwaves are determined. The results suggest that large gaps between the plasma columns weaken the absorption and reflection of electromagnetic (EM) waves by the plasma column array. Increasing the plasma column radius can improve the absorption and reflection of EM waves and realize the limiting function. In addition, the double-layer plasma column array structure combined with absorbing material can prevent the loss of EM waves and optimally achieve the EM wave absorption effect. This study can provide more effective guidelines for microwave protection applications.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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