Wasif ur Rehman , Akbar Ali , Sarah A. Alsalhi , Taoufik Saidani , Izaz Ul Haq , Imad Khan
{"title":"应变对稀土磁性氧化物RMO3 (R= La, Pr)物理性能的影响M = Fe, Mn);通过第一性原理","authors":"Wasif ur Rehman , Akbar Ali , Sarah A. Alsalhi , Taoufik Saidani , Izaz Ul Haq , Imad Khan","doi":"10.1016/j.mssp.2024.109153","DOIUrl":null,"url":null,"abstract":"<div><div>The impact of uniaxial strain on the structure, electronic, magnetic, and elastic characteristic of rare-earth transition metal oxides RMO<sub>3</sub> (R= La, Pr; M = Fe, Mn) are investigated for potential applications in magnetic storage devices, sensors, photovoltaics, and electronic devices using first-principles based density functional theory calculations, incorporating the Hubbard parameter U. These materials are stable in orthorhombic crystal symmetry (space group Pnma No. 62) and possesses spontaneous MO<sub>6</sub> octahedral distortion, which causes stability in the crystal lattice and is responsible to arise cooperative Jahn-Teller (JT) distortions. There is a strong influence of strain on structure parameters such as lattice constants, bond lengths and Q<sub>2</sub>/Q<sub>3</sub> vibrational modes. This influence provides a knob for tuning the physical properties of these materials, which is essential for advanced materials engineering in their technological applications. G-type antiferromagnetic (G-AFM) phase was found to have a favorable magnetic ground state and can be tuned with strain, which can enhance the storage capacity of these materials. These materials are direct band and optically active materials with ground state band gap values 2.11, 2.06, 2.01 and 2.03 eV for LaFeO<sub>3</sub>, PrFeO<sub>3</sub>, LaMnO<sub>3</sub>, and PrMnO<sub>3</sub> respectively, the band gap values lies in the visible region of electromagnetic spectrum, enable them for advanced technological applications in transistors, photo-detectors and optoelectronic devices. Further the band gap values can be tuned via strain for desired device applications. The elastic constants calculations reveal that the crystallographic <em>c</em>-axis is more favorable for compressibility as compared to <em>a</em>- and <em>b</em>-axis.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"188 ","pages":"Article 109153"},"PeriodicalIF":4.2000,"publicationDate":"2024-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Strain-induced effects on the physical properties of rare-earth magnetic oxides RMO3 (R= La, Pr; M = Fe, Mn); via first principles\",\"authors\":\"Wasif ur Rehman , Akbar Ali , Sarah A. Alsalhi , Taoufik Saidani , Izaz Ul Haq , Imad Khan\",\"doi\":\"10.1016/j.mssp.2024.109153\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>The impact of uniaxial strain on the structure, electronic, magnetic, and elastic characteristic of rare-earth transition metal oxides RMO<sub>3</sub> (R= La, Pr; M = Fe, Mn) are investigated for potential applications in magnetic storage devices, sensors, photovoltaics, and electronic devices using first-principles based density functional theory calculations, incorporating the Hubbard parameter U. These materials are stable in orthorhombic crystal symmetry (space group Pnma No. 62) and possesses spontaneous MO<sub>6</sub> octahedral distortion, which causes stability in the crystal lattice and is responsible to arise cooperative Jahn-Teller (JT) distortions. There is a strong influence of strain on structure parameters such as lattice constants, bond lengths and Q<sub>2</sub>/Q<sub>3</sub> vibrational modes. This influence provides a knob for tuning the physical properties of these materials, which is essential for advanced materials engineering in their technological applications. G-type antiferromagnetic (G-AFM) phase was found to have a favorable magnetic ground state and can be tuned with strain, which can enhance the storage capacity of these materials. These materials are direct band and optically active materials with ground state band gap values 2.11, 2.06, 2.01 and 2.03 eV for LaFeO<sub>3</sub>, PrFeO<sub>3</sub>, LaMnO<sub>3</sub>, and PrMnO<sub>3</sub> respectively, the band gap values lies in the visible region of electromagnetic spectrum, enable them for advanced technological applications in transistors, photo-detectors and optoelectronic devices. Further the band gap values can be tuned via strain for desired device applications. The elastic constants calculations reveal that the crystallographic <em>c</em>-axis is more favorable for compressibility as compared to <em>a</em>- and <em>b</em>-axis.</div></div>\",\"PeriodicalId\":18240,\"journal\":{\"name\":\"Materials Science in Semiconductor Processing\",\"volume\":\"188 \",\"pages\":\"Article 109153\"},\"PeriodicalIF\":4.2000,\"publicationDate\":\"2024-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Science in Semiconductor Processing\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1369800124010497\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800124010497","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Strain-induced effects on the physical properties of rare-earth magnetic oxides RMO3 (R= La, Pr; M = Fe, Mn); via first principles
The impact of uniaxial strain on the structure, electronic, magnetic, and elastic characteristic of rare-earth transition metal oxides RMO3 (R= La, Pr; M = Fe, Mn) are investigated for potential applications in magnetic storage devices, sensors, photovoltaics, and electronic devices using first-principles based density functional theory calculations, incorporating the Hubbard parameter U. These materials are stable in orthorhombic crystal symmetry (space group Pnma No. 62) and possesses spontaneous MO6 octahedral distortion, which causes stability in the crystal lattice and is responsible to arise cooperative Jahn-Teller (JT) distortions. There is a strong influence of strain on structure parameters such as lattice constants, bond lengths and Q2/Q3 vibrational modes. This influence provides a knob for tuning the physical properties of these materials, which is essential for advanced materials engineering in their technological applications. G-type antiferromagnetic (G-AFM) phase was found to have a favorable magnetic ground state and can be tuned with strain, which can enhance the storage capacity of these materials. These materials are direct band and optically active materials with ground state band gap values 2.11, 2.06, 2.01 and 2.03 eV for LaFeO3, PrFeO3, LaMnO3, and PrMnO3 respectively, the band gap values lies in the visible region of electromagnetic spectrum, enable them for advanced technological applications in transistors, photo-detectors and optoelectronic devices. Further the band gap values can be tuned via strain for desired device applications. The elastic constants calculations reveal that the crystallographic c-axis is more favorable for compressibility as compared to a- and b-axis.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.