通过多步写入脉冲提高选择器专用存储器的可靠性

IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Yoori Seo;Sanghyun Ban;Jangseop Lee;Dongmin Kim;Laeyong Jung;Hyunsang Hwang
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引用次数: 0

摘要

在这项研究中,我们调查了过冲电流(Iover)对基于椭圆阈值开关(OTS)的纯选择器存储器(SOM)器件可靠性的影响。我们发现,与传统的方形脉冲相比,在写入操作过程中实施多步脉冲可将 Iover 减少 40%,显著降低读取过程中的阈值电压 (Vth) 变化,从而确保足够的读取窗口余量,并将耐用性提高一个数量级以上。我们的分析表明,Iover 会导致离子变异性增加,进而导致写脉冲对后续读取过程的影响变异性增大。此外,Iover 还会产生额外的注入电荷,直接导致器件应力增加,严重影响耐用性。通过间歇和连续脉冲测量,我们证实了 Iover 在循环稳定性中的关键作用。我们的研究结果凸显了抑制 Iover 对提高 SOM 可靠性的重要性,强调了优化多步脉冲方法的必要性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhancing Selector-Only Memory Reliability Through Multi-Step Write Pulse
In this study, we investigated the impact of overshoot current (Iover) on the reliability of selector-only memory (SOM) devices based on an ovonic threshold switch (OTS). We found that implementing a multi-step pulse during the write operation reduced Iover by 40%, significantly decreased threshold voltage (Vth) variability during the read process to ensure sufficient read window margin, and improved endurance by more than an order of magnitude, compared to the traditional square pulse. Our analysis revealed that the Iover leads to increased Ion variability, which in turn causes greater variability in the write pulse’s impact on subsequent read process. Furthermore, Iover generates extra injection charge, which directly correlating with increased device stress and significantly impacting endurance. Through intermittent and continuous pulse measurements, we confirmed the critical role of Iover in cycling stability. Our findings underscore the importance of suppressing Iover to enhance SOM reliability, emphasizing the need for optimizing the multi-step pulse method.
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来源期刊
IEEE Electron Device Letters
IEEE Electron Device Letters 工程技术-工程:电子与电气
CiteScore
8.20
自引率
10.20%
发文量
551
审稿时长
1.4 months
期刊介绍: IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.
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