Fabrication of disk ultramicroelectrode using nanoskiving method.

The detection time of the ultramicroelectrode can be reduced to nanoseconds when compared to the macroscopic electrode, enabling real-time monitoring of the instantaneous electrochemical behavior of the microstructure. Preparing ultramicroelectrode thus has drawn great attention recently. In the present study, a novel method for the preparation of disk ultramicroelectrodes with controllable electrode end sizes based on the nanoskiving method is proposed. The feature dimensions of the ultramicroelectrode can be controlled by the nanoskiving parameters. The electrochemical performance of the prepared ultramicroelectrode is evaluated in the solution system consisting of a 1 mM FcMeOH (ferrocenyl methanol) and 0.1 M KCl aqueous solution. The steady-state limit current deviation rate of the electrode is 7%, and it can work continuously for 600 s. Moreover, the electrode is integrated with micrometer precision scanning and positioning devices, which conduct electrochemical characterization of the micron structure array sample. The electrochemical image of the tin-doped indium oxide sample is measured successfully. The funding in this study provides a novel method to prepare ultramicroelectrodes. Importantly, high-precision electrochemical imaging equipment is established that can be used to measure electrochemical images.