反应式直流和大功率脉冲磁控溅射沉积的氧化钛薄膜的溅射方法、微观结构和性能之间的相关性

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2024-11-15 DOI:10.1016/j.tsf.2024.140573

Younes Lablali , Rachid Oubaki , Anas Ghailane , Jones Alami , Mohammed Makha

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引用次数: 0

摘要

本研究通过反应式高功率脉冲磁控溅射（HiPIMS）和反应式直流磁控溅射（DcMS）制备了氧化钛（TiOx）薄膜。我们利用 X 射线衍射、扫描电子显微镜、能量色散 X 射线光谱和紫外可见光谱等多种技术分析了氧活性气体含量对 TiOx 薄膜的结构、形态和光学特性的影响。我们发现，HiPIMS 沉积的薄膜呈现出锐钛矿相和金红石相的混合结构，而 DcMS 沉积的薄膜则呈现出纯锐钛矿相结构。此外，与 DcMS 沉积薄膜相比，HiPIMS 沉积薄膜的晶粒尺寸更小，表面更光滑。元素分析表明，HiPIMS 生长的薄膜始终是超化学计量的，而在 DcMS 生长的薄膜中则观察到了从亚化学计量到超化学计量的转变。此外，通过 HiPIMS 沉积的 TiOx 薄膜的光带隙值高于通过 DcMS 沉积的薄膜，并且随着氧气流速的增加而减小。利用 TRIM 计算评估了在 HiPIMS 和 DcMS 沉积过程中到达生长薄膜的颗粒的平均能量，证实了观察到的结构差异。

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Correlation between sputtering method, microstructure and properties of TiOx thin films deposited by reactive direct-current and high-power impulse magnetron sputtering

In this study, Titanium oxide (TiO_x) thin films were produced via reactive High-Power Impulse Magnetron Sputtering (HiPIMS) and reactive Direct-current Magnetron Sputtering (DcMS). The influence of oxygen reactive gas content on the structural, morphological, and optical characteristics of TiO_x films was analyzed using various techniques including X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy, and UV–visible spectroscopy. We found that HiPIMS-deposited films exhibited a mixed anatase and rutile phase structure, while DcMS-deposited films showed a pure anatase structure. Additionally, HiPIMS deposited films demonstrated smaller grain sizes and smoother surfaces compared to DcMS deposited films. Elemental analysis revealed that HiPIMS-grown films were consistently over-stoichiometric, whereas a transition from sub to over-stoichiometric composition was observed in the DcMS-grown films. Moreover, the optical band gap values of TiO_x films deposited via HiPIMS were higher than those deposited via DcMS, decreasing as the oxygen flow rate increased. TRIM calculations were employed to assess the average energy of particles reaching the growing film in both HiPIMS and DcMS depositions, confirming the observed structural differences.

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.