基于掩膜-化学机械抛光技术的片上单晶铌酸锂波导微结构的制造

IF 4.6 2区 物理与天体物理 Q1 OPTICS
Zhigang Jiang , Shengshui Wang , Min Xu , Wei Wang , Chaoyang Wei , Zhenqi Niu
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引用次数: 0

摘要

近年来,单晶铌酸锂薄膜(TFLN)光子器件已成为一个非常热门的研究领域。TFLN光子器件的掩膜-化学机械抛光(CMP)蚀刻技术因其在高效、大规模制造集成光子器件微结构方面的潜力而备受关注。本文重点介绍使用掩膜-CMP 技术蚀刻 TFLN 波导微结构所涉及的物理过程。本文创新性地将超弹性抛光垫的压力分布函数与普雷斯顿方程相结合,建立了有限元理论模型。在此模型的基础上,对影响蚀刻效率和波导结构的因素,如载荷大小、接触压力和掩膜尺寸等,进行了系统的理论计算和分析。模拟结果与实验数据进行了比较。这项研究为利用掩模-CMP 刻蚀技术推进大规模、高效率制造 TFLN 光子芯片提供了理论参考。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication of on-chip single-crystal lithium niobate waveguide microstructures based on mask-chemical mechanical polishing technology
Single-crystal thin-film lithium niobate (TFLN) photonic devices have become a highly popular research area in recent years. The mask-chemical mechanical polishing (CMP) etching technique for TFLN photonic devices has garnered significant attention due to its potential for the efficient and large-scale fabrication of integrated photonic device microstructures. This paper focuses on the physical processes involved in etching TFLN waveguide microstructures using mask-CMP technology. Innovatively, the pressure distribution function of a superelastic polishing pad is combined with the Preston equation to establish a finite element theoretical model. Based on this model, systematic theoretical calculations and analyses were conducted on factors affecting etching efficiency and waveguide structure, such as load magnitude, contact pressure, and mask dimensions. The simulation results were compared with experimental data. This research provides a theoretical reference for advancing the large-scale, high-efficiency fabrication of TFLN photonic chips using mask-CMP etching technology.
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来源期刊
CiteScore
8.50
自引率
10.00%
发文量
1060
审稿时长
3.4 months
期刊介绍: Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems
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