{"title":"知识蒸馏跨领域扩散模型:缺陷模式分割的生成式人工智能方法","authors":"Yuanfu Yang;Min Sun","doi":"10.1109/TSM.2024.3472611","DOIUrl":null,"url":null,"abstract":"In semiconductor manufacturing, defect detection is pivotal for enhancing productivity and yield. This paper introduces a novel weakly supervised method, the Implicit Cross Domain Diffusion Model (ICDDM), designed to tackle defect pattern segmentation challenges in the absence of detailed pixel-wise annotations. ICDDM employs a generative model to estimate the joint distribution of images depicting defect patterns and background circuits, formulating this estimation as a Markov Chain and optimizing it through denoising score matching. Building on this, we propose the Cross Domain Latent Diffusion Model (CDLDM), inspired by the Latent Diffusion Model, which simplifies the diffusion process into a lower-dimensional latent space to boost detection efficiency. Further enhancing our model, we introduce the Knowledge Distillation Cross Domain Diffusion Model (KDCDDM), which utilizes CDLDM as a teacher model and a Generative Adversarial Network (GAN) as a student model. This approach significantly accelerates the diffusion process by reducing the number of necessary denoising iterations while maintaining robust model performance. This suite of techniques offers a comprehensive solution for efficient and effective defect detection in semiconductor production environments.","PeriodicalId":451,"journal":{"name":"IEEE Transactions on Semiconductor Manufacturing","volume":"37 4","pages":"634-642"},"PeriodicalIF":2.3000,"publicationDate":"2024-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Knowledge Distillation Cross Domain Diffusion Model: A Generative AI Approach for Defect Pattern Segmentation\",\"authors\":\"Yuanfu Yang;Min Sun\",\"doi\":\"10.1109/TSM.2024.3472611\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In semiconductor manufacturing, defect detection is pivotal for enhancing productivity and yield. This paper introduces a novel weakly supervised method, the Implicit Cross Domain Diffusion Model (ICDDM), designed to tackle defect pattern segmentation challenges in the absence of detailed pixel-wise annotations. ICDDM employs a generative model to estimate the joint distribution of images depicting defect patterns and background circuits, formulating this estimation as a Markov Chain and optimizing it through denoising score matching. Building on this, we propose the Cross Domain Latent Diffusion Model (CDLDM), inspired by the Latent Diffusion Model, which simplifies the diffusion process into a lower-dimensional latent space to boost detection efficiency. Further enhancing our model, we introduce the Knowledge Distillation Cross Domain Diffusion Model (KDCDDM), which utilizes CDLDM as a teacher model and a Generative Adversarial Network (GAN) as a student model. This approach significantly accelerates the diffusion process by reducing the number of necessary denoising iterations while maintaining robust model performance. This suite of techniques offers a comprehensive solution for efficient and effective defect detection in semiconductor production environments.\",\"PeriodicalId\":451,\"journal\":{\"name\":\"IEEE Transactions on Semiconductor Manufacturing\",\"volume\":\"37 4\",\"pages\":\"634-642\"},\"PeriodicalIF\":2.3000,\"publicationDate\":\"2024-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Semiconductor Manufacturing\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10702557/\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Semiconductor Manufacturing","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10702557/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Knowledge Distillation Cross Domain Diffusion Model: A Generative AI Approach for Defect Pattern Segmentation
In semiconductor manufacturing, defect detection is pivotal for enhancing productivity and yield. This paper introduces a novel weakly supervised method, the Implicit Cross Domain Diffusion Model (ICDDM), designed to tackle defect pattern segmentation challenges in the absence of detailed pixel-wise annotations. ICDDM employs a generative model to estimate the joint distribution of images depicting defect patterns and background circuits, formulating this estimation as a Markov Chain and optimizing it through denoising score matching. Building on this, we propose the Cross Domain Latent Diffusion Model (CDLDM), inspired by the Latent Diffusion Model, which simplifies the diffusion process into a lower-dimensional latent space to boost detection efficiency. Further enhancing our model, we introduce the Knowledge Distillation Cross Domain Diffusion Model (KDCDDM), which utilizes CDLDM as a teacher model and a Generative Adversarial Network (GAN) as a student model. This approach significantly accelerates the diffusion process by reducing the number of necessary denoising iterations while maintaining robust model performance. This suite of techniques offers a comprehensive solution for efficient and effective defect detection in semiconductor production environments.
期刊介绍:
The IEEE Transactions on Semiconductor Manufacturing addresses the challenging problems of manufacturing complex microelectronic components, especially very large scale integrated circuits (VLSI). Manufacturing these products requires precision micropatterning, precise control of materials properties, ultraclean work environments, and complex interactions of chemical, physical, electrical and mechanical processes.