钽阳极表面无定形 Ta2O5 层局部破坏的机理

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2024-11-15 DOI:10.1016/j.tsf.2024.140564

B.E. Pushkarev, R.M. Nikonova, V.I. Lad'ynov

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引用次数: 0

摘要

本研究根据钽的高吸收特性，提出了钽阳极表面无定形氧化钽 Ta2O5 的破坏机理。对表层缺陷区域形态特征的分析数据表明，非晶膜的破坏是由于金字塔形缺陷的生长造成的；金字塔形缺陷与非晶表面 Ta2O5 不一致，也不是其结晶的产物。金字塔 "的成核和生长是由于氧在钽表面氧化过程中沿着晶界定向移动到钽基体的三重连接区域，随后在局部形成结晶 Ta2O5。在使用高纯度钽粉末的情况下，可以实现所建议的晶粒破坏机制。

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Mechanism of the local destruction of the amorphous Ta2O5 layer on the surface of a tantalum anode

In the present work, a mechanism of the destruction of amorphous tantalum oxide Ta₂O₅ on the tantalum anode surface is suggested based on high absorption properties of tantalum. The data of analysis of the morphological peculiarities of the defective areas of the surface layers show that the destruction of the amorphous film occurs due to the growth of a pyramid-shaped defect; the pyramidal defect is not coherent with amorphous surface Ta₂O₅, and it is not a product of its crystallization. The nucleation and growth of the “pyramid” occurs due to the directed movement of oxygen during the oxidation of the tantalum surface along the grain boundaries to the region of triple junctions of the tantalum matrix with the subsequent local formation of crystalline Ta₂O₅. The suggested mechanism offig destruction can be realized when high-purity tantalum powders are used.

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.